NA89
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
12/21/2020
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Official data from USPTO
JUSUNG
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: CombinedOffice: US
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
38
Latest update
12/21/2020
Classification
Registered
Trademark type
Combined
Nice classes
7, 37
Filing date
10/16/2008
Registration date
10/20/2009
Expiration date
-
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Next step
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Complete case details
Structured fields from the responsible authority and the official record.
Status date
12/21/2020
Last transaction
12/21/2020
Responsible office
United States Patent and Trademark Office
Status code
800
Official register
Principal Register
Drawing code
5
Owner type
03
Owner location
Gyeonggi-do, KR
Examiner
HACK, ANDREA R
Law office
L80
Current location
GENERIC WEB UPDATE
Mark description
The mark consists of the word "JUSUNG".
Holders and representatives
Holders
JUSUNG engineering Co. Ltd.
Representatives
Rebecca A. Liebowitz VENABLE LLP
Technical classification
Nice Classes
Class 7Class 37
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
Semiconductor processing machines; Semiconductor wafer processing machines; Atomic layer deposition (ALD) machines; Chemical vapor deposition (CVD) machines; Ultra high vacuum chemical vapor deposition (CVD) machines; Low pressure chemical vapor deposition (CVD) machines; Metal organic chemical vapor deposition (CVD) machines; Rapid thermal chemical vapor deposition (CVD) machines; High temperature chemical vapor deposition (CVD) machines; Atmospheric pressure chemical vapor deposition (CVD) machines; Middle pressure chemical vapor deposition (CVD) machines; Diffusion machines used for semiconductor manufacturing; Plasma enhanced chemical vapor deposition (PECVD) machines; Plasma chemical vapor deposition (PCVD) machines; Vapor epitaxial growth machines used for semiconductor manufacturing; Liquid epitaxial growth machines used for semiconductor manufacturing; Oxidation machines used for semiconductor manufacturing; Anealing machines used for semiconductor manufacturing; Deposition machines used for semiconductor manufacturing; Etching machines used for semiconductor manufacturing; Sputtering machines used for semiconductor manufacturing; Photolithography machines used for semiconductor manufacturing; Developing machines used for semiconductor manufacturing; Ashing machines used for semiconductor manufacturing; Cleaning machines used for semiconductor manufacturing; Polishing machines used for semiconductor manufacturing; Deposition machines used for liquid crystal display (LCD) manufacturing; Etching machines used for liquid crystal display (LCD) manufacturing; Sputtering machines used for liquid crystal display (LCD) manufacturing; Photolithography machines used for liquid crystal display (LCD) manufacturing; Developing machines used for liquid crystal display (LCD) manufacturing; Ashing machines used for liquid crystal display(LCD) manufacturing; Cleaning machines used for liquid crystal display (LCD) manufacturing; Polishing machines used for liquid crystal display (LCD) manufacturing; Deposition machines used for solar cells manufacturing; Etching machines used for solar cells manufacturing ; Sputtering machines used for solar cells manufacturing; Photolithography machines used for solar cells manufacturing; Developing machines used for solar cells manufacturing; Ashing machines used for solar cells manufacturing; Cleaning machines used for solar cells manufacturing; Polishing machines used for solar cells manufacturing
Class 37
Installationmaintenance and repair of semiconductor processing machines and systems; Installationmaintenance and repair of semiconductor wafer processing machines; Installationmaintenance and repair of atomic layer deposition (ALD) machines; Installationmaintenance and repair of chemical Vapor Deposition (CVD) machines; Installationmaintenance and repair of ultra high vacuum chemical vapor deposition (CVD) machines; Installationmaintenance and repair of low pressure chemical vapor deposition (CVD) machines; Installationmaintenance and repair of metal organic chemical vapor deposition (CVD) machines; Installationmaintenance and repair of rapid thermal chemical vapor deposition (CVD) machines; Installationmaintenance and repair of high temperature chemical vapor deposition (CVD) machines; Installationmaintenance and repair of atmospheric pressure chemical vapor deposition (CVD) machines; Installationmaintenance and repair of middle pressure chemical vapor deposition (CVD) machines; Installationmaintenance and repair of diffusion machines used for semiconductor manufacturing; Installationmaintenance and repair of plasma enhanced chemical vapor deposition (PECVD) machines; Installationmaintenance and repair of plasma chemical vapor deposition (PCVD) machines; Installationmaintenance and repair of vapor epitaxial growth machines used for semiconductor manufacturing; Installationmaintenance and repair of liquid epitaxial growth machines used for semiconductor manufacturing; Installationmaintenance and repair of oxidation machines used for semiconductor manufacturing; Installationmaintenance and repair of Anealing machines used for semiconductor manufacturing; Installationmaintenance and repair of deposition machines used for semiconductor manufacturing; Installationmaintenance and repair of etching machines used for semiconductor manufacturing; Installationmaintenance and repair of sputtering machines used for semiconductor manufacturing; Installationmaintenance and repair of photolithography machines used for semiconductor manufacturing; Installationmaintenance and repair of developing machines used for semiconductor manufacturing; Installationmaintenance and repair of ashing machines used for semiconductor manufacturing; Installationmaintenance and repair of cleaning machines used for semiconductor manufacturing; Installationmaintenance and repair of polishing machines used for semiconductor manufacturing; Installationmaintenance and repair of deposition machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of etching machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of sputtering machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of photolithography machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of developing machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of ashing machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of cleaning machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of polishing machines used for liquid crystal display (LCD) manufacturing; Installationmaintenance and repair of deposition machines used for solar cells manufacturing; Installationmaintenance and repair of etching machines used for solar cells manufacturing ; Installationmaintenance and repair of sputtering machines used for solar cells manufacturing; Installationmaintenance and repair of photolithography machines used for solar cells manufacturing; Installationmaintenance and repair of developing machines used for solar cells manufacturing; Installationmaintenance and repair of ashing machines used for solar cells manufacturing; Installationmaintenance and repair of cleaning machines used for solar cells manufacturing; Installationmaintenance and repair of polishing machines used for solar cells manufacturing
Publications
History of USPTO decisions and trademark events.
38 publications found
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
12/21/2020
RNL1
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
12/21/2020
89AG
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
12/21/2020
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
07/09/2020
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
07/09/2020
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
07/09/2020
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
07/09/2020
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
07/09/2020
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
07/09/2020
EROP
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
12/20/2019
PR89
POST REGISTRATION ACTION MAILED - SEC. 8 & 9
06/25/2019
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
06/24/2019
E89R
TEAS SECTION 8 & 9 RECEIVED
06/05/2019
NAS8
NOTICE OF ACCEPTANCE OF SEC. 8 - MAILED
11/02/2015
8.OK
REGISTERED - SEC. 8 (6-YR) ACCEPTED
11/02/2015
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/02/2015
8.AF
REGISTERED - SEC. 8 (6-YR) FILED
10/19/2015
PAPER RECEIVED
10/19/2015
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
01/24/2010
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
01/24/2010
R.PR
REGISTERED-PRINCIPAL REGISTER
10/20/2009
PUBO
PUBLISHED FOR OPPOSITION
08/04/2009
NPUB
NOTICE OF PUBLICATION
07/15/2009
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
07/01/2009
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
06/24/2009
CNFR
FINAL REFUSAL MAILED
06/12/2009
CNFR
FINAL REFUSAL WRITTEN
06/11/2009
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
05/22/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
05/22/2009
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
05/21/2009
CNRT
NON-FINAL ACTION MAILED
01/21/2009
CNRT
NON-FINAL ACTION WRITTEN
01/16/2009
DOCK
ASSIGNED TO EXAMINER
01/16/2009
AMPX
PRELIMINARY/VOLUNTARY AMENDMENT - ENTERED
11/18/2008
ALIE
ASSIGNED TO LIE
11/18/2008
PAPER RECEIVED
11/05/2008
NWAP
NEW APPLICATION ENTERED
10/20/2008
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