Official data from INPI

DISPOSITIVO PARA ENCHER VASOS DE DEPOSICAO COM RESIDUOS RADIATIVOS,VASO DE DEPOSICAO E PROCESSO PARA OPERAR ESSE DISPOSITIVO

Em AnáliseInvention Patent

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Application data

Number

PI7802817

Type

Invention Patent

Filing

05/06/1977

Publication

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Progress at the INPI

Filing05/06/77
Publication
Examination
Allowance02/24/82
Grant
Expired11/30/93

The letters patent expired on 11/30/1993: the term of protection has ended. The technology is in the public domain and may be freely used in Brazil.

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Latest action published by the INPI: 06/08/1982. We update with every new RPI gazette, published weekly.

Applicants and inventors

Applicants

STEAG KERNENERGIE GMBH

Inventors

No inventors listed.

Technical data

IPC Classification

No IPC classification.

Prosecution history

Publications in the Brazilian Industrial Property Gazette (RPI).

Notificação para pagamento de retribuição

#13.1

06/08/1982

RPI 607

Deferimento

#9.1

02/24/1982

RPI 592

Carta-patente expirada

#21.1

11/30/1993

RPI 1200

From the same holder

MÉTODO PARA PREVENIR A HIDRÓLISE RELACIONADA COM FLUORELASTÔMEROS DE UMA CORRENTE GASOSA E ARTIGO FLUOROELASTOMÉRICO.GALPÃO DE ARMAZENAMENTO PARA RECIPIENTES CHEIOS DE MATERIAL RADIOATIVO CALORÍFICO DISPOSITIVO PARA ARMAZENAMENTO DEFINITIVO DE MATERIAIS RESIDUAIS RADIOATIVOS PROCESSO APERFEICOADO E INSTALACAO PARA A REMOCAO DE RESIDUOS RADIOATIVOS DE USINAS NUCLEARES

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