NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
10/11/2022
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Official data from USPTO
MCSS MC CHEMICAL SOLUTIONS FOR SEMICONDUCTOR
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Active USPTO registrationType: CombinedOffice: United States
Quick snapshot
ST13
US500000090645253Class
1, 19, 37, 40, 42
Filing
90645253
Registration
6868895
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
20
Latest update
10/11/2022
Trademark type
Combined
Nice classes
1, 19, 37, 40, 42
Filing date
04/14/2021
Registration date
10/11/2022
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
10/11/2022
Last transaction
10/11/2022
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Filing basis
Foreign priority
Drawing code
5
Owner type
03
Owner location
Tokyo, JP
Examiner
QUEEN, ESTHER FELICIA
Law office
M20
Current location
PUBLICATION AND ISSUE SECTION
Mark description
The mark consists of the wording "MCSS" in blue stylized font stacked over the wording "MC Chemical Solutions for Semiconductor" in black stylized font.
Holders and representatives
Holders
M. C. (pessoa física)
Representatives
Charles T. J. Weigell FROSS ZELNICK LEHRMAN & ZISSU, P.C.
Technical classification
Nice Classes
Class 1Class 19Class 37Class 40Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 1
Chemicals for use in industry and science; industrial chemicals; silicon dioxide; etching solutions for silicon compounds and metal; etching gels for industrial purposes; etching agentsetching mordants being acids and alkaline; surface active compounds for general use in the industrial artsas wettingspreadingemulsifyingdispersingpenetratingsmoothinglevelinganti-static and surface treating agents; anti-static preparationsother than for household purposes; water-soluble and electroconductive polymerspolymer compositions used in the manufacture of commercial and industrial goods; water-soluble and electroconductive polymer base compositionspolymer compositions used in the manufacture of commercial and industrial goods; unprocessed polymers; electroconductive polymerspolymer compositions used in the manufacture of commercial and industrial goods; electroconductive polymers for electronic materialspolymer compositions used in the manufacture of commercial and industrial goods; unprocessed plastics; photosensitive polymers for photoresist materials; photoresists; silicon dioxide powders; industrial chemicals made from SiO2; etchants for use in the manufacture of semiconductors; hydrochloric acid; nitric acid; ammonia water; sulfuric acid; hydrogen peroxide for industrial purposes; detergents for use in manufacturing processes; detergents for semiconductor wafers for use in semiconductor manufacturing processes; unprocessed plastics containing carbon nanotube; unprocessed polycarbonate resins containing carbon nanotube
Class 19
Non-metallic minerals for building or construction; quartz
Class 37
Repair or maintenance of electronic machines and apparatus; repair or maintenance of integrated circuits manufacturing machines and systems; repair or maintenance of semiconductor manufacturing machines and systems; repair and maintenance of vacuum pumps; cleaning of metals; cleaning of semiconductors; cleaning of semiconductor wafers; cleaning of ceramics; applying of resin coating for others; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to glass and quartz; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastic componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramic componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to glass componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal surfaces; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastics; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastic surfaces; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramics; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramic surfaces
Class 40
Treatment of metals; treatment of surfaces of metals; processing of semiconductors; processing of semiconductors in the nature of treatment of semiconductors; manufacturing processing of semiconductor wafers; processing of semiconductor wafers; processing of semiconductor wafers in the nature of treatment of semiconductor wafers; custom assembling of semiconductors and integrated circuits; custom manufacturing and assembling of semiconductorswafers and integrated circuits; processing of alumite; grinding; abrasive blasting services; sand blasting services; shot blasting services; grit blasting services; dry ice blasting services; processing of quartz; nickel plating; treatment of metal materials; treatment of plastic materials; treatment of ceramic materials; heat treatment and coating of surfaces of high-vacuum installationshandling systemsincluding steppers for semiconductor manufacturingcomponents for the aforesaid installations and systemsthe aforesaid installations and systems in particular for the manufacture of semiconductors and semiconductor elements; heat treatment and coating of surfaces of high-vacuum installations and handling systems including steppers for semiconductor manufacturing; heat treatment and coating of surfaces of components for high-vacuum installations and handling systems including steppers for semiconductor manufacturing; heat treatment and coating of surfaces of high-vacuum installations and handling systems in particular for the manufacture of semiconductors and semiconductor elements; heat treatment and coating of surfaces of components for high-vacuum installations and handling systems in particular for the manufacture of semiconductors and semiconductor elements; processing of plastic resins; processing of artificial and epoxy resins; processing of synthetic plastic resins; custom processing in the nature of treatment of synthetic resins and metals; recycling of silicon wafers; recycling of used parts for use in semiconductor manufacturing processes; metal plating; electroplating; electroless plating; electroplating of wafers; electroless plating of wafers; assembly of metal products for others; providing thermal spraying treatment services for treating the surface of semiconductor manufacturing and processing equipment and the internal parts in order to form a coating over surface of the equipment and the internal parts during the semiconductor manufacturing and processing under customer consignment and specifications
Class 42
Materials testing and analysisquality control inspectionresearch on metals; testing and analysis and evaluation of semiconductor wafers; research and development of plating methods; research and development services relating to solar cells and electricity generation
Publications
History of USPTO decisions and trademark events.
20 publications found
R.PR
REGISTERED-PRINCIPAL REGISTER
10/11/2022
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
07/26/2022
PUBO
PUBLISHED FOR OPPOSITION
07/26/2022
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
07/06/2022
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
06/22/2022
XAEC
EXAMINER'S AMENDMENT ENTERED
06/21/2022
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
06/21/2022
GNEA
EXAMINERS AMENDMENT E-MAILED
06/21/2022
CNEA
EXAMINERS AMENDMENT -WRITTEN
06/21/2022
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
06/15/2022
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
06/15/2022
ALIE
ASSIGNED TO LIE
06/14/2022
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
06/07/2022
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
12/08/2021
GNRT
NON-FINAL ACTION E-MAILED
12/08/2021
CNRT
NON-FINAL ACTION WRITTEN
12/08/2021
DOCK
ASSIGNED TO EXAMINER
12/06/2021
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
07/22/2021
NWAP
NEW APPLICATION ENTERED
04/17/2021
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