R.PR
REGISTERED-PRINCIPAL REGISTER
08/31/2021
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Official data from USPTO
GUIDANCE
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Active USPTO registrationType: WordOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
25
Latest update
08/31/2021
Trademark type
Word
Nice classes
7
Filing date
03/16/2020
Registration date
08/31/2021
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
08/31/2021
Last transaction
08/31/2021
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Filing basis
Foreign priority
Drawing code
4
Owner type
03
Owner location
Gwangju-si, Gyeonggi-d, KR
Examiner
MCCARTHY, JOSEPH PATRICK
Law office
N90
Current location
PUBLICATION AND ISSUE SECTION
Holders and representatives
Holders
JUSUNG Engineering Co., Ltd.
Representatives
Rebecca Liebowitz VENABLE LLP
Technical classification
Nice Classes
Class 7
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
semiconductor processing machines; low pressure chemical vapor deposition machines; plasma chemical vapor deposition machines; plasma enhanced chemical vapor deposition machines; metal organic chemical vapor deposition machines; deposition machines used for manufacturing semiconductors; etching machines used for manufacturing semiconductors; deposition machines used for manufacturing solar cells; etching machines used for manufacturing solar cells; deposition machines used for manufacturing light emitting diodes (LEDs); etching machines used for manufacturing light emitting diodes (LEDs); deposition machines used for manufacturing organic light emitting diodes (OLEDs); etching machines used for manufacturing organic light emitting diodes (OLEDs); deposition machines used for manufacturing flat panel displays; etching machines used for manufacturing flat panel displays; atomic layer deposition (ALD) machines used for manufacturing semiconductors; atomic layer deposition (ALD) machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing light emitting diodes (LEDs); atomic layer deposition (ALD) machines used for manufacturing organic light emitting diodes (OLEDs); atomic layer deposition (ALD) machines used for manufacturing flat panel displays
Publications
History of USPTO decisions and trademark events.
25 publications found
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
06/15/2021
PUBO
PUBLISHED FOR OPPOSITION
06/15/2021
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
05/26/2021
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
05/07/2021
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
05/06/2021
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
05/06/2021
ERSI
TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED
05/03/2021
GNS3
NOTIFICATION OF LETTER OF SUSPENSION E-MAILED
02/19/2021
GNSL
LETTER OF SUSPENSION E-MAILED
02/19/2021
CNSL
SUSPENSION LETTER WRITTEN
02/19/2021
XAEC
EXAMINER'S AMENDMENT ENTERED
02/19/2021
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
02/19/2021
GNEA
EXAMINERS AMENDMENT E-MAILED
02/19/2021
CNEA
EXAMINERS AMENDMENT -WRITTEN
02/19/2021
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
02/11/2021
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
02/11/2021
ALIE
ASSIGNED TO LIE
02/10/2021
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
11/09/2020
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
06/10/2020
GNRT
NON-FINAL ACTION E-MAILED
06/10/2020
CNRT
NON-FINAL ACTION WRITTEN
06/10/2020
DOCK
ASSIGNED TO EXAMINER
06/08/2020
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
03/20/2020
NWAP
NEW APPLICATION ENTERED
03/19/2020
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