REM1
COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
06/30/2025
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Official data from USPTO
ADVANCED SURFACE CREATION
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: WordOffice: United States
Quick snapshot
ADVANCED SURFACE CREATION
ST13
US500000088588347Class
1, 3, 7
Filing
88588347
Registration
6089093
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
21
Latest update
07/01/2025
Trademark type
Word
Nice classes
1, 3, 7
Filing date
08/22/2019
Registration date
06/30/2020
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
06/30/2020
Last transaction
07/01/2025
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Drawing code
4
Owner type
03
Owner location
OSAKA, JP
Examiner
BELLO, ZACK
Law office
M20
Current location
TMO LAW OFFICE 111
Holders and representatives
Holders
N. I. (pessoa física)
N. I. (pessoa física)
Representatives
Helen Hill Minsker Banner & Witcoff, Ltd.
Technical classification
Nice Classes
Class 1Class 3Class 7
Vienna Codes
No Vienna codes available.
Goods and services
Class 1
Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals
Class 3
Polishing pads; abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing cloth; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations
Class 7
Work holding instruments for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank components for semiconductor wafer surface polishing machines and apparatus; mounting films for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting films for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting films for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting films for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting films for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus
Publications
History of USPTO decisions and trademark events.
21 publications found
A7OK
AMENDMENT UNDER SECTION 7 - PROCESSED
11/23/2020
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/20/2020
ES7R
TEAS SECTION 7 REQUEST RECEIVED
07/30/2020
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
07/15/2020
R.PR
REGISTERED-PRINCIPAL REGISTER
06/30/2020
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
04/14/2020
PUBO
PUBLISHED FOR OPPOSITION
04/14/2020
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
03/25/2020
FIXD
ELECTRONIC RECORD REVIEW COMPLETE
03/11/2020
ERRR
ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED
03/06/2020
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
03/01/2020
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
02/06/2020
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
02/06/2020
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
02/06/2020
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
12/01/2019
GNRT
NON-FINAL ACTION E-MAILED
12/01/2019
CNRT
NON-FINAL ACTION WRITTEN
12/01/2019
DOCK
ASSIGNED TO EXAMINER
11/22/2019
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
09/06/2019
NWAP
NEW APPLICATION ENTERED
08/26/2019
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