NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
11/17/2025
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Official data from USPTO
SUPRASIL
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: WordOffice: United States
Quick snapshot
SUPRASIL
ST13
US500000087748802Class
9, 11, 21
Filing
87748802
Registration
5672654
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
30
Latest update
11/18/2025
Trademark type
Word
Nice classes
9, 11, 21
Filing date
01/09/2018
Registration date
02/12/2019
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
11/17/2025
Last transaction
11/18/2025
Responsible office
United States Patent and Trademark Office
Status code
702
Official register
Principal Register
Filing basis
Foreign priority
Drawing code
4
Owner type
16
Owner location
Hanau, DE
Examiner
WILKE, JOHN
Current location
Historical data usage
Holders and representatives
Holders
Heraeus Quarzglas GmbH & Co. KG
Heraeus Quarzglas GmbH & Co. KG
Representatives
Daniel M. Gurfinkel Dennemeyer & Associates, LLC
Technical classification
Nice Classes
Class 9Class 11Class 21
Vienna Codes
No Vienna codes available.
Goods and services
Class 9
Measurement apparatusapparatus for determining the change in resistance of a material on irradiation with ultraviolet (UV) radiation and for detecting a radiation dose; scientific and technical apparatusoptical windowslensesmirrorsprisms or reflectors of natural or synthetic quartz glassfor use in detectors for determining physical variables of electromagnetic wavesspectrometersreflectometersinterferometerslaser cavitiesinstallations for photolithographic structuring of a photoresist layerin particular in installations for photolithographic structuring of a photoresist layer in the manufacture of integrated circuitsinstallations for immersion lithographyinstallations for extreme ultraviolet lithography (EUV)in particular in installations for EUV lithography in the manufacture of integrated circuitselements for coupling of pump light into active laser fiberselements for coupling of laser light into passive transmission fiberslaser heads for focusingshaping or positioning of a laser beamin particular laser heads for focusingshaping or positioning of a laser beam in industrial cutting and welding systemsconnectors of passive laser cablesin particular for transmission of laser beams from the place of production to the place of usevacuum chambers for modification of surfacesin particular for vaporizinghardeningsputtering or plasma etching of surfacesin particular for LED manufacturecamera systems for telescopesin particular which examine a wide wavelength rangeincluding the near-infrared rangeoptics for laser fusion projectscamera systems for optical quality control or for control of positioning systemsin particular camera systems for optical quality control or for control of positioning systems which work within a wavelength range of 2000 - 3500 nm
Class 11
Lighting apparatuslighting installationslampsarc lampsgermicidal burners for laboratory usefurnacesother than for laboratory usedistillation apparatus not for scientific purposesgas lampsgas purification machines; Lighting systems and lighting devices for lighting systems for curingcleaning or activating surfaces for preparing further process steps or for modifying surface structureall the aforesaid steps in particular using ultraviolet (UV) radiation
Class 21
Fused silica as a semi-worked productother than for buildingsemi-worked products made therefromtubespolesplatesblocks; quartz glass bodiesquartz glass and semi finished quartz glasspipesrodsplates and blockspreferably for lighting systems and lighting means for lighting systems; quartz glass vitreous silica fibersnot for textile use; Opaque quartz glass and opaque quartz glass fibersnot for textile use; Synthetic quartz glass and synthetic quartz glass fibersnot for textile use; Natural quartz glass and quartz glass fibers of natural quartz glassnot for textile use
Publications
History of USPTO decisions and trademark events.
30 publications found
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
11/17/2025
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/17/2025
E815
TEAS SECTION 8 & 15 RECEIVED
07/31/2025
REM1
COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
02/12/2024
ASCK
ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY
05/03/2023
COC.
CORRECTION UNDER SECTION 7 - PROCESSED
04/12/2019
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
03/28/2019
ES7R
TEAS SECTION 7 REQUEST RECEIVED
02/26/2019
R.PR
REGISTERED-PRINCIPAL REGISTER
02/12/2019
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
11/27/2018
PUBO
PUBLISHED FOR OPPOSITION
11/27/2018
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
11/07/2018
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
10/23/2018
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
10/22/2018
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/22/2018
PAPER RECEIVED
10/19/2018
GNS3
NOTIFICATION OF LETTER OF SUSPENSION E-MAILED
10/09/2018
GNSL
LETTER OF SUSPENSION E-MAILED
10/09/2018
CNSL
SUSPENSION LETTER WRITTEN
10/09/2018
ACEC
AMENDMENT FROM APPLICANT ENTERED
10/06/2018
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/06/2018
ALIE
ASSIGNED TO LIE
09/30/2018
PAPER RECEIVED
09/19/2018
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
04/18/2018
GNRT
NON-FINAL ACTION E-MAILED
04/18/2018
CNRT
NON-FINAL ACTION WRITTEN
04/18/2018
DOCK
ASSIGNED TO EXAMINER
04/18/2018
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
01/23/2018
NWAP
NEW APPLICATION ENTERED
01/12/2018
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