NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
09/02/2025
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Official data from USPTO
G
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Active USPTO registrationType: CombinedOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
35
Latest update
09/03/2025
Trademark type
Combined
Nice classes
7, 11
Filing date
12/19/2017
Registration date
11/05/2019
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
09/02/2025
Last transaction
09/03/2025
Responsible office
United States Patent and Trademark Office
Status code
702
Official register
Principal Register
Filing basis
Intent to use
First use anywhere
07/04/2018
First use in commerce
03/26/2019
Drawing code
5
Owner type
99
Owner location
MONGKOK, HONG KONG, CN
Examiner
ROSSMAN, WILLIAM
Current location
Historical data usage
Mark description
The mark consists of a stylized letter "G" in black with a green shadow.
Holders and representatives
Holders
GENES TECH GROUP HOLDINGS COMPANY LIMITED
Representatives
Joe McKinney Muncy MUNCY, GEISSLER, OLDS & LOWE, P.C.
Technical classification
Nice Classes
Class 7Class 11
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
Robotic arms for industrial purposes; Loading and unloading machines; Lifting installations for the transport of persons and goods; Semiconductor wafer processing equipment and componentsepitaxial reactorschemical vapor deposition reactorsphysical vapor deposition reactorsplasma etchersion implanterssupporting frames thereforparts thereof; Industrial machineryelectromechanical marking machines; Vacuum pumps; Mechanical seals being machine parts; Axles for machines; Transmission shaftsother than for land vehicles; Industrial robots; Pumps for machines; Pumps as parts of machinesmotors and engines; Heat exchangers being parts of machines; Power transmission belts for machines; Industrial chemical reactors; Plasma etching machines; Machine partshoods; Ejectors as parts of machines; Chemical-mechanical polishing and cleaning machines; Dry semiconductor processing equipmentplasma etching machinessemiconductor wafer processing equipmentsingle-wafer etching machines; Semiconductor processing equipmentsubstrate bakingcoatingcleaningdeveloping and drying machines; Chemical machinessemiconductor wafer drying machinessemiconductor wafer scrubbing and washing machines; Semiconductor wafer processing machines; Etching machines used for manufacturing semiconductor wafers; Cleaning machines used for manufacturing semiconductor wafers; Semiconductor wafer cleaning and etching equipment; Semiconductor wet processing equipment; Chemical delivery equipment for semiconductor circuits and wafer processing; Machines for wet-chemical processesin particular machines for the transportation and for wet chemical etchingcleaningdryingsurface coatingplating processesfor use in electroplating and electroless plating of semiconductor waferssemiconductor chipsmedical implantsphotovoltaic wafers and photovoltaic cells; Machinesinstallations for wet-chemical etchingwet-chemical cleaningdrying and platingelectro and electroless depositions processing of different substratesparticularly semiconductor waferssemi-conductor chipsmedical implantsphotovoltaic wafersphotovoltaic cells; automated transportation and measuring machines for wet-chemical processes; Component parts of machinesfeeders in the nature of loading and unloading machineschucks for use in the manufacturing of semiconductor devicesmolds for use in the manufacturing of semiconductor devices; Handling apparatus for loading and unloadingloading and unloading machines; and Holding devices for use in the manufacturing of semiconductor devices; Machines for making computer chips and semiconductors for the chip and semiconductor industries; Semiconductor manufacturing equipmenta substrate masking apparatus preferably for use with an ion implanter; Semiconductor processing and manufacturing equipment having coatingdevelopingthermal treatment capabilities used for the processing and production of semiconductor substratesthin filmsphoto-resist materialssilicon discs and wafers; Semiconductor manufacturing machines; Semiconductor wafer processing equipment; Semiconductor wafer processing machines; Physical vapor deposition machines and complete ion implantation machines comprised of ion sourcesion accelerators and scannersprocessing chambersvacuum systemspower supplies and controlsion sources; Machinesmachine tools and equipmentsemi-automaticmanual and automatic assembly machines; Machines for treatment of electronic components; Wafer frame cleaning machine; Semiconductor processing machines; Semiconductor cleaning machines; Semiconductor diagnosticssupport and maintenance machinesreplacement parts for use therewith; Semiconductor substrates manufacturing machines; Semiconductor substrates processing machines; Semiconductor substrates cleaning machines; Semiconductor wafer manufacturing machines; Integrated circuit manufacturing machines; Integrated circuits processing machines; Integrated circuit cleaning machinesintegrated circuit polishing machinesintegrated circuit diagnosticssupport and maintenance machinesreplacement parts for use therewith; Machines and precise mechanical apparatus for the production and processing of electronicmicro mechanic and optical components; Coating machines for the production and processing of electronicmicro mechanic and optical componentsin particular spin coater and spray coater; Bonding devices for the production and processing of electronicmicro mechanic and optical componentsbonderused for processing the connection between chip and lead frame; mask alignment apparatus for the production and processing of electronicmicro mechanic and optical componentsmask aligner; Apparatus for cleaning semiconductor wafersmasksflat panelsdisplay and other substratesscrubber and clean track scrubber; Semiconductor wafer cleaning devices for use in semiconductor wafer cleaning and etching equipmentwet bench; Semiconductor wafer cleaning devices for use in chemical mechanical polishing machines for cleaning semiconductor wafersin the nature of a CMP chemical mechanical polishing sponge
Class 11
Furnace used in Semiconductor Processing Equipment; Furnacesother than for laboratory use; Furnaces
Publications
History of USPTO decisions and trademark events.
35 publications found
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
09/02/2025
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
09/02/2025
E815
TEAS SECTION 8 & 15 RECEIVED
04/25/2025
REM1
COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
11/05/2024
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
12/28/2022
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
12/28/2022
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
12/28/2022
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
12/28/2022
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
12/23/2022
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
12/23/2022
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
12/23/2022
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
12/23/2022
R.PR
REGISTERED-PRINCIPAL REGISTER
11/05/2019
SUNA
NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED
10/01/2019
CNPR
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
09/28/2019
SUPC
STATEMENT OF USE PROCESSING COMPLETE
09/11/2019
AITU
CASE ASSIGNED TO INTENT TO USE PARALEGAL
09/11/2019
IUAF
USE AMENDMENT FILED
08/13/2019
EISU
TEAS STATEMENT OF USE RECEIVED
08/13/2019
NOAM
NOA E-MAILED - SOU REQUIRED FROM APPLICANT
02/19/2019
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
12/25/2018
PUBO
PUBLISHED FOR OPPOSITION
12/25/2018
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
12/05/2018
ALIE
ASSIGNED TO LIE
11/12/2018
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
10/30/2018
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
10/04/2018
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/04/2018
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
10/04/2018
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
04/05/2018
GNRT
NON-FINAL ACTION E-MAILED
04/05/2018
CNRT
NON-FINAL ACTION WRITTEN
04/05/2018
DOCK
ASSIGNED TO EXAMINER
03/29/2018
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
01/05/2018
NWAP
NEW APPLICATION ENTERED
12/22/2017
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