FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
11/23/2024
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Official data from USPTO
LASERTEC
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: CombinedOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
38
Latest update
11/23/2024
Trademark type
Combined
Nice classes
7, 9
Filing date
10/26/2022
Registration date
05/07/2024
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
05/07/2024
Last transaction
05/07/2024
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Drawing code
5
Owner type
03
Owner location
JP
Examiner
HUSSAIN, TASNEEM
Law office
M90
Current location
FILE REPOSITORY (FRANCONIA)
Mark description
The mark consists of the stylized wording "LASERTEC".
Holders and representatives
Holders
L. C. (pessoa física)
Representatives
George W. Lewis WHDA, LLP
Technical classification
Nice Classes
Class 7Class 9
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays
Class 9
Semiconductor photomask optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatusoptical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatusoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatusoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amountoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatusoptical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatusoptical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatusoptical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatusoptical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposessemiconductor testing apparatus; precision crystallographic measuring apparatus; data setsdownloadablein the field of semiconductors; computer softwarerecordedfor operating semiconductor photomaskreticle or pellicle optical inspection apparatus; computer software applicationsdownloadablefor operating semiconductor photomaskreticle or pellicle optical inspection apparatus; computer hardware; computer programsdownloadablefor operating semiconductor photomaskreticle or pellicle optical inspection apparatus
Publications
History of USPTO decisions and trademark events.
38 publications found
FICS
FINAL DISPOSITION NOTICE SENT TO IB
11/03/2024
FIMP
FINAL DISPOSITION PROCESSED
11/02/2024
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
08/07/2024
NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
05/07/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
05/07/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
03/04/2024
GPNX
NOTIFICATION PROCESSED BY IB
02/26/2024
PUBO
PUBLISHED FOR OPPOSITION
02/20/2024
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
02/07/2024
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
02/07/2024
NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/03/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
01/31/2024
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
01/31/2024
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
01/17/2024
XAEC
EXAMINER'S AMENDMENT ENTERED
01/02/2024
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
01/02/2024
GNEA
EXAMINERS AMENDMENT E-MAILED
01/02/2024
CNEA
EXAMINERS AMENDMENT -WRITTEN
01/02/2024
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
12/08/2023
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
12/07/2023
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
12/07/2023
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
07/20/2023
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
07/20/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
07/20/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
07/20/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
07/20/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
07/20/2023
RFNT
REFUSAL PROCESSED BY IB
07/11/2023
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
06/20/2023
RFRR
REFUSAL PROCESSED BY MPU
06/20/2023
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
05/11/2023
CNRT
NON-FINAL ACTION WRITTEN
05/10/2023
DOCK
ASSIGNED TO EXAMINER
05/09/2023
MAFR
APPLICATION FILING RECEIPT MAILED
01/24/2023
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
01/20/2023
LIMI
LIMITATION FROM ORIGINAL APPLICATION ENTERED
01/20/2023
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
01/19/2023
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