FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
11/30/2024
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Official data from USPTO
NOVASIC
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Active USPTO registrationType: WordOffice: United States
Quick snapshot
NOVASIC
ST13
US500000079358894Class
9, 40, 42
Filing
79358894
Registration
7394032
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
37
Latest update
11/30/2024
Trademark type
Word
Nice classes
9, 40, 42
Filing date
09/27/2022
Registration date
05/28/2024
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
05/28/2024
Last transaction
05/28/2024
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Drawing code
4
Owner type
34
Owner location
FR
Examiner
BARRETT, LEAH
Law office
N80
Current location
FILE REPOSITORY (FRANCONIA)
Holders and representatives
Holders
NOVASIC
Representatives
Mari-Elise Paul McBrayer PLLC
Technical classification
Nice Classes
Class 9Class 40Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 9
Single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different machining operationsoperations for conducting cutsmeplatsbevels; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface preparation operations ready for epitaxy or bondinglappingprecision grindingmechanical and chemical mechanical (CMP) polishingcleaninglaser marking operations; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components; all these goods being used in precision grindingmechanical and chemical mechanical polishing (CMP) operations and other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling
Class 40
mechanical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to machining operationsprocessing for conducting cutsmeplatsbevels; mechanicalchemical and optical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to for surface preparation operationslappingprecision grindingmechanical and chemical mechanical (CMP) polishingcleaninglaser marking operations; other mechanicalchemical and physical surface treatmentsused for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; surface characterization process beingphysicalchemical and opticaltopographyroughness and chemical analysis; structure characterization method being chemical or physicalmorphology and crystal structure; all these services being provided in the field of semiconductor or piezoelectric materials or oxides for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling
Class 42
Testing of machining techniquestechnical tests and trials for conducting cutsmeplatsbevels; testing and tests of surface preparation techniquestechnical testing and testing of lappingprecision grindingmechanical and chemical mechanical polishing (CMP)cleaninglaser marking; technical tests of other surface treatments for others in the field of materials used to for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; research and development for new products for others; research and development of new consumable products for others used in machining operationsoperations for conducting cutsmeplatsbevels; research and development of new consumable products for others for use in surface preparation operationslappingprecision grindingmechanical and chemical mechanical (CMP) polishingcleaninglaser marking operations; research and development of new consumables for others used in other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; technical advice for conducting machining operationsoperations for conducting cutsmeplatsbevels; technical advice for conducting surface preparation operationslappingprecision grindingmechanical and chemical mechanical (CMP) polishingcleaninglaser marking operations; technical advice for conducting other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; technical advice for surface characterizationtopographyroughness and chemical analysis; technical advice for structure characterizationmorphology and crystallography; all these services being provided in the field of semiconductor or piezoelectric materials or oxides for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding
Publications
History of USPTO decisions and trademark events.
37 publications found
FICS
FINAL DISPOSITION NOTICE SENT TO IB
11/12/2024
FIMP
FINAL DISPOSITION PROCESSED
11/12/2024
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
08/28/2024
NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
05/28/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
05/28/2024
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
04/11/2024
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
04/11/2024
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
04/11/2024
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
04/11/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
03/12/2024
GPNX
NOTIFICATION PROCESSED BY IB
03/12/2024
PUBO
PUBLISHED FOR OPPOSITION
03/12/2024
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
02/21/2024
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
02/21/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
02/21/2024
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
02/21/2024
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
02/06/2024
XAEC
EXAMINER'S AMENDMENT ENTERED
02/06/2024
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
02/06/2024
GNEA
EXAMINERS AMENDMENT E-MAILED
02/06/2024
CNEA
EXAMINERS AMENDMENT -WRITTEN
02/06/2024
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
01/18/2024
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
01/18/2024
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
01/18/2024
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
01/18/2024
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
01/18/2024
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
01/18/2024
RFNT
REFUSAL PROCESSED BY IB
09/13/2023
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
08/19/2023
RFRR
REFUSAL PROCESSED BY MPU
08/19/2023
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
07/26/2023
CNRT
NON-FINAL ACTION WRITTEN
07/25/2023
DOCK
ASSIGNED TO EXAMINER
07/12/2023
MAFR
APPLICATION FILING RECEIPT MAILED
01/07/2023
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
01/03/2023
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
12/30/2022
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