NURC
NOTICE OF UPDATED REGISTRATION CONFIRMATION EMAILED
04/29/2025
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Official data from USPTO
LITHOGRAPHY PLUS
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: WordOffice: United States
Quick snapshot
LITHOGRAPHY PLUS
ST13
US500000079357897Class
9, 37, 42
Filing
79357897
Registration
7333980
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
34
Latest update
04/30/2025
Trademark type
Word
Nice classes
9, 37, 42
Filing date
08/15/2022
Registration date
03/26/2024
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
03/26/2024
Last transaction
04/30/2025
Responsible office
United States Patent and Trademark Office
Status code
700
Official register
Principal Register
Drawing code
4
Owner type
03
Owner location
Ohta-ku Tokyo 146-8501, JP
Examiner
LEE, CATHERINE
Current location
Historical data usage
Holders and representatives
Holders
C. K. (pessoa física)
C. K. (pessoa física)
Representatives
Dennis McMahon Venable LLP
Technical classification
Nice Classes
Class 9Class 37Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 9
Downloadable computer software for monitoring performance of semiconductor lithography equipment; downloadable computer software for monitoring the operation of semiconductor lithography equipment; downloadable computer software for the operation of semiconductor lithography equipment; downloadable computer software for fault diagnosis and anomaly detection of semiconductor lithography equipment; downloadable computer software for automatic restoration of semiconductor lithography equipment; downloadable computer software for remotely providing technical advice relating to performance and operation of semiconductor lithography equipment; downloadable computer software for providing of information relating to the operating status of semiconductor lithography equipment; downloadable computer software for providing optimum setting information for semiconductor lithography equipmentfor providing information in the field of improving productivity thereof; downloadable computer software for providing support and maintenance information for semiconductor lithography equipment; downloadable computer software for providing proposals for replacement of parts of semiconductor lithography equipment
Class 37
Repair or maintenance of semiconductor lithography equipment and providing information relating thereto
Class 42
Providing temporary use of on-line non-downloadable computer software for monitoring performance of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for monitoring the operation of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for the operation of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for fault diagnosis and anomaly detection of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for automatic restoration of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for remotely providing technical advice relating to performance and operation of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for providing of information relating to the operating status of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for providing optimum setting information of semiconductor lithography equipmentfor providing information in the field of improving productivity thereof; providing temporary use of on-line non-downloadable computer software for providing support and maintenance information of semiconductor lithography equipment; providing temporary use of on-line non-downloadable computer software for providing proposals for replacement of parts of semiconductor lithography equipment; designcreationrepair and maintenance of computer software for semiconductor lithography equipment; remote monitoring service of the functioning and use of semiconductor lithography equipment for industrial analysis and quality control; technological consultancy relating to performance and operation of semiconductor lithography equipment; providing information relating to industrial analysis and quality control of production processes using semiconductor lithography equipment; providing information of industrial analysis and quality control services relating to semiconductor lithography equipment; analysis of technical data of semiconductor lithography equipment and providing information relating thereto
Publications
History of USPTO decisions and trademark events.
34 publications found
ERRR
ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED
12/05/2024
COC.
CORRECTION UNDER SECTION 7 - PROCESSED
12/04/2024
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/14/2024
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
11/02/2024
FICS
FINAL DISPOSITION NOTICE SENT TO IB
10/16/2024
FIMP
FINAL DISPOSITION PROCESSED
10/16/2024
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
06/27/2024
ES7R
TEAS SECTION 7 REQUEST RECEIVED
05/02/2024
NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
03/26/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
03/26/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
01/09/2024
PUBO
PUBLISHED FOR OPPOSITION
01/09/2024
GPNX
NOTIFICATION PROCESSED BY IB
01/08/2024
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
12/20/2023
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
12/20/2023
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
12/20/2023
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
12/07/2023
XAEC
EXAMINER'S AMENDMENT ENTERED
12/07/2023
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
12/07/2023
GNEA
EXAMINERS AMENDMENT E-MAILED
12/07/2023
CNEA
EXAMINERS AMENDMENT -WRITTEN
12/07/2023
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
11/30/2023
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
11/29/2023
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
11/29/2023
RFNT
REFUSAL PROCESSED BY IB
08/07/2023
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
07/20/2023
RFRR
REFUSAL PROCESSED BY MPU
07/20/2023
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
06/15/2023
CNRT
NON-FINAL ACTION WRITTEN
06/14/2023
DOCK
ASSIGNED TO EXAMINER
06/02/2023
MAFR
APPLICATION FILING RECEIPT MAILED
12/23/2022
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
12/19/2022
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
12/17/2022
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