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Official data from USPTO

SHISEIDO SECOND SKIN TECHNOLOGY

Did you know this trademark is already registered in United States?

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Active USPTO registrationType: WordOffice: United States

Quick snapshot

SHISEIDO SECOND SKIN TECHNOLOGY

ST13

US500000079348286

Class

1, 2

Filing

79348286

Registration

7256717

Risk and opportunity diagnosis

Executive reading for naming, filing, and monitoring decisions.

USPTO status

Active USPTO registration

Case type

Application and registration

Recorded events

30

Latest update

01/11/2026

Trademark type

Word

Nice classes

1, 2

Filing date

04/18/2022

Registration date

01/02/2024

Expiration date

-

Complete case details

Structured fields from the responsible authority and the official record.

Status date

01/02/2024

Last transaction

01/11/2026

Responsible office

United States Patent and Trademark Office

Status code

700

Official register

Principal Register

Drawing code

4

Owner type

03

Owner location

JP

Examiner

FENNESSY,EDWARD JOHN

Law office

L10

Current location

TMEG LAW OFFICE 101

Holders and representatives

Holders

Shiseido Company, Limited

Representatives

Masahiro Noda Noda Law Group, PC

Technical classification

Nice Classes

Class 1Class 2

Vienna Codes

No Vienna codes available.

Goods and services

Class 1

Chemicals for use in the manufacture of cosmeticssoapsperfumery and industrial adhesives; chemical additives for use in the manufacture of cosmetics; plant growth regulating preparations; fertilizers; higher fatty acids for use in the manufacture of cosmeticssoapsperfumery and industrial adhesives; chemical test paper; artificial sweeteners; flour and starch for industrial purposes; flour and starch for industrial purposes for use in the manufacture of cosmetics; collagen used as a raw ingredient in the manufacture of cosmetics; chemical preparations for use in the manufacture of cosmetics; proteins for use in the manufacture of cosmetics

Class 2

Copal; sandarac; shellac; dammar; wood preservatives; pigments; printing ink; anti-corrosion greases; non-ferrous metal foil for use in paintingdecoratingprinting and art; precious metals in foil or powder form for use in paintingdecoratingprinting and art

Publications

History of USPTO decisions and trademark events.

30 publications found

TCCA

TEAS CHANGE OF CORRESPONDENCE RECEIVED

01/09/2026

ECDR

TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS

01/09/2026

ARAA

ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED

01/09/2026

REAP

TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED

01/09/2026

FINO

FINAL DECISION TRANSACTION PROCESSED BY IB

04/29/2024

FICS

FINAL DISPOSITION NOTICE SENT TO IB

04/08/2024

FIMP

FINAL DISPOSITION PROCESSED

04/08/2024

FICR

FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB

04/02/2024

NRCC

NOTICE OF REGISTRATION CONFIRMATION EMAILED

01/02/2024

R.PR

REGISTERED-PRINCIPAL REGISTER

01/02/2024

NPUB

OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED

10/17/2023

PUBO

PUBLISHED FOR OPPOSITION

10/17/2023

GPNX

NOTIFICATION PROCESSED BY IB

10/16/2023

OPNS

NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB

09/27/2023

OP2R

NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB

09/27/2023

NONP

NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED

09/27/2023

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

09/11/2023

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

07/19/2023

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

07/19/2023

TROA

TEAS RESPONSE TO OFFICE ACTION RECEIVED

07/19/2023

RFNT

REFUSAL PROCESSED BY IB

02/15/2023

RFCS

NON-FINAL ACTION MAILED - REFUSAL SENT TO IB

01/21/2023

RFRR

REFUSAL PROCESSED BY MPU

01/21/2023

RFCR

NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW

11/17/2022

CNRT

NON-FINAL ACTION WRITTEN

11/16/2022

DOCK

ASSIGNED TO EXAMINER

11/16/2022

MAFR

APPLICATION FILING RECEIPT MAILED

09/06/2022

NWOS

NEW APPLICATION OFFICE SUPPLIED DATA ENTERED

08/31/2022

LIMI

LIMITATION FROM ORIGINAL APPLICATION ENTERED

08/30/2022

REPR

SN ASSIGNED FOR SECT 66A APPL FROM IB

08/25/2022

Continuous trademark protection

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