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Official data from USPTO

AMASS

Did you know this trademark is already registered in United States?

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Active USPTO registrationType: WordOffice: United States

Quick snapshot

AMASS

ST13

US500000079242147

Class

9, 42

Filing

79242147

Registration

5706420

Risk and opportunity diagnosis

Executive reading for naming, filing, and monitoring decisions.

USPTO status

Active USPTO registration

Case type

Application and registration

Recorded events

28

Latest update

01/17/2026

Trademark type

Word

Nice classes

9, 42

Filing date

06/22/2018

Registration date

03/26/2019

Expiration date

-

Complete case details

Structured fields from the responsible authority and the official record.

Status date

05/16/2025

Last transaction

01/17/2026

Responsible office

United States Patent and Trademark Office

Status code

707

Official register

Principal Register

Drawing code

4

Owner type

26

Owner location

EA Almelo, NL

Examiner

LIU,PHILIP

Current location

Historical data usage

Holders and representatives

Holders

Malvern Panalytical B.V.
Malvern Panalytical B.V.

Representatives

Ken M. Sheets Whitestone Law PLLC

Technical classification

Nice Classes

Class 9Class 42

Vienna Codes

No Vienna codes available.

Goods and services

Class 9

Computer software for use in analyzing thin films and thin layers; computer software for use in displayingsimulatingfitting X-ray scattering data from single crystal substrates and heteroepitaxial layers; computer software for use in characterizing thin films and thin layers

Class 42

Designdevelopmentimplementation and programming of computer software for use in analyzing thin films and thin layers; designdevelopmentimplementation and programming of computer software for use in displayingsimulatingfitting X-ray scattering data from single crystal substrates and heteroepitaxial layers; designdevelopmentimplementationprogramming of computer software for use in characterizing thin films and thin layers; installation and repair services relating to computer software for use in analyzing thin films and thin layers; installation and repair services relating to computer software for use in displayingsimulatingfitting X-ray scattering data from single crystal substrates and heteroepitaxial layers; installation and repair services relating to computer software for use in characterizing thin films and thin layers

Publications

History of USPTO decisions and trademark events.

28 publications found

INPR

PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED

01/16/2026

NREP

NEW REPRESENTATIVE AT IB RECEIVED

05/16/2025

NA71

NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED

05/16/2025

71.P

REGISTERED - PARTIAL SEC 71 ACCEPTED

05/16/2025

APRE

CASE ASSIGNED TO POST REGISTRATION PARALEGAL

05/05/2025

ES71

TEAS SECTION 71 RECEIVED

01/02/2025

REM3

COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED

03/26/2024

FINO

FINAL DECISION TRANSACTION PROCESSED BY IB

08/16/2019

FICS

FINAL DISPOSITION NOTICE SENT TO IB

07/30/2019

FIMP

FINAL DISPOSITION PROCESSED

07/30/2019

FICR

FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB

06/26/2019

R.PR

REGISTERED-PRINCIPAL REGISTER

03/26/2019

NPUB

OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED

01/08/2019

PUBO

PUBLISHED FOR OPPOSITION

01/08/2019

NONP

NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED

12/19/2018

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

11/23/2018

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

11/21/2018

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

11/20/2018

TROA

TEAS RESPONSE TO OFFICE ACTION RECEIVED

11/20/2018

RFNT

REFUSAL PROCESSED BY IB

11/17/2018

RFCS

NON-FINAL ACTION MAILED - REFUSAL SENT TO IB

10/31/2018

RFRR

REFUSAL PROCESSED BY MPU

10/31/2018

RFCR

NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW

10/17/2018

CNRT

NON-FINAL ACTION WRITTEN

10/16/2018

MAFR

APPLICATION FILING RECEIPT MAILED

10/16/2018

DOCK

ASSIGNED TO EXAMINER

10/11/2018

NWOS

NEW APPLICATION OFFICE SUPPLIED DATA ENTERED

10/10/2018

REPR

SN ASSIGNED FOR SECT 66A APPL FROM IB

10/04/2018

Continuous trademark protection

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