C71T
CANCELLED SECTION 71
03/06/2026
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Official data from USPTO
ZENITH
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Active USPTO registrationType: WordOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
19
Latest update
03/31/2026
Trademark type
Word
Nice classes
7
Filing date
07/22/2014
Registration date
04/07/2015
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
03/06/2026
Last transaction
03/31/2026
Responsible office
United States Patent and Trademark Office
Status code
709
Official register
Principal Register
Drawing code
4
Owner type
03
Owner location
Gwangju-si Gyeonggi-do, KR
Examiner
BROWN, TINA
Law office
M90
Current location
GENERIC WEB UPDATE
Holders and representatives
Holders
JUSUNG ENGINEERING Co., Ltd.
JUSUNG ENGINEERING Co., Ltd.
Representatives
Rebecca A. Liebowitz VENABLE LLP
Technical classification
Nice Classes
Class 7
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
Semiconductor processing machines; low pressure chemical vapor deposition machines; plasma chemical vapor deposition machines; plasma enhanced chemical vapor deposition machines; metal organic chemical vapor deposition machines; deposition machines used for manufacturing semiconductors; etching machines used for manufacturing semiconductor; deposition machines used for manufacturing solar cells; etching machines used for manufacturing solar cells; deposition machines used for manufacturing light emitting diode (LED); etching machines used for manufacturing light emitting diode (LED); deposition machines used for manufacturing organic light emitting diodes (OLED); etching machines used for manufacturing organic light emitting diodes (OLED); deposition machines used for manufacturing flat panel display; etching machines used for manufacturing flat panel display; atomic layer deposition (ALD) machines used for manufacturing semiconductor; atomic layer deposition (ALD) machines used for manufacturing solar cells; atomic layer deposition (ALD) machines used for manufacturing light emitting diode (LED); atomic layer deposition (ALD) machines used for manufacturing organic light emitting diodes (OLED); atomic layer deposition (ALD) machines used for manufacturing flat panel display
Publications
History of USPTO decisions and trademark events.
19 publications found
RNWL
INTERNATIONAL REGISTRATION RENEWED
07/26/2024
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
04/07/2024
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
07/26/2021
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
07/26/2021
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
07/26/2021
ES75
TEAS SECTION 71 & 15 RECEIVED
03/29/2021
GPNX
NOTIFICATION PROCESSED BY IB
06/26/2015
FICS
FINAL DISPOSITION NOTICE SENT TO IB
06/10/2015
FIMP
FINAL DISPOSITION PROCESSED
06/10/2015
GPAR
GRANT OF PROTECTION CREATED, TO BE SENT TO IB
05/07/2015
R.PR
REGISTERED-PRINCIPAL REGISTER
04/07/2015
PUBO
PUBLISHED FOR OPPOSITION
01/20/2015
NPUB
NOTICE OF PUBLICATION
12/31/2014
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
12/13/2014
MAFR
APPLICATION FILING RECEIPT MAILED
12/12/2014
DOCK
ASSIGNED TO EXAMINER
12/08/2014
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
12/08/2014
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
12/04/2014
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