TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
12/05/2023
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Official data from USPTO
EDWARDS
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Active USPTO registrationType: WordOffice: United States
Quick snapshot
EDWARDS
ST13
US500000079057965Class
4, 6, 7, 9, 11, 37, 40, 41, 42
Filing
79057965
Registration
3799630
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
65
Latest update
12/05/2023
Trademark type
Word
Nice classes
4, 6, 7, 9, 11, 37, 40, 41, 42
Filing date
10/17/2007
Registration date
06/08/2010
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
09/30/2020
Last transaction
12/05/2023
Responsible office
United States Patent and Trademark Office
Status code
706
Official register
Principal Register
Drawing code
4
Owner type
11
Owner location
West Sussex, GB
Examiner
FENNESSY, EDWARD
Law office
M50
Current location
GENERIC WEB UPDATE
Holders and representatives
Holders
Edwards Limited
Edwards Limited
Representatives
William S. Fultz Womble Bond Dickinson (US) LLP
Technical classification
Nice Classes
Class 4Class 6Class 7Class 9Class 11Class 37Class 40Class 41Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 4
Industrial oilsmineral oilssilicone oilssynthetic oils and perfluoropolyether oils; Industrial lubricants; Industrial greases; Industrial greasesgreases used as vacuum sealants
Class 6
METAL VACUUM FLANGE AND METAL VACUUM FLANGE FITTINGS; METAL CLAMPS; COMMERCIAL CONTAINERS OF METAL FOR TRANSPORTING SEMICONDUCTOR PROCESSING EQUIPMENT
Class 7
Vacuum pumps; oil sealed vacuum pumps; rotary vane pumps; oil sealed rotary pumps; oil sealed piston pumps; vacuum booster pumps; vacuum scroll pumps; dry vacuum pumps; liquid ring vacuum pumps; industrial dry vacuum pumps; vacuum diaphragm pumps; jet pumps; turbo molecular pumps; compound molecular pumps; regenerative pumps; sub-atmospheric vapour pumps; diffusion pumps; chemical pumping systems comprised of valvesvesselspipingfittingspositive displacement pumpsgauges and controllers; vacuum pumps for vacuum shelf dryers; steam ejector pumpsall of the aforementioned goods for pumping gases and not for the control of liquids; vacuum deposition machines for deposition of films for use in semiconductor and solar panel processes
Class 9
Spectrograph apparatus; mass spectrometers; instruments and apparatus for use in testingcontroldetectionmonitoring and the analysis of materials in scientific and industrial operationsinfrared spectrometersultraviolet spectrometersparticle size analyzers and electro chemical sensors; pressure gauges for measuring gas pressure below atmospheric pressure and not including pressure gauges for the measurement of liquids; pressure regulators for use in scientific and industrial vacuum apparatus; leak detectors for fluid leaks in sciatic and industrial vacuum systems or apparatus; ionization gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; magnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; vacuum gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; convection gauges for use in scientific and industrial vacuum apparatus and solely in connection with pumping gases and not for the control of liquids; thermocouple gauges for use in scientific and industrial vacuum apparatus and solely in connection with pumping gases and not for the control of liquids; penning gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; ion gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquidsmagnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; inverted magnetron gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; wide range gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; thermocouple gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; strain gauges for use in scientific and industrial vacuum apparatus and systems solely in connection with pumping gases and not for the control of liquids; electroacoustic transducers; electrical controllers for gaugescapsule dial gauges for use in scientific and industrial vacuum apparatus and systems; gas sensors for measuring the concentration or presence of target gases in a gas streammoisture sensors; calibration apparatusinstruments and equipment for the calibration of scientific and industrial vacuum apparatusvacuum instrumentation and vacuum equipment; computer software for monitoring system status and providing data relating to vacuumexhaust abatementchemical use and gas userelating to the manufacture of semiconductors and integrated circuits; computer software for designing and configuring gaschemicalvacuum and exhaust management systems machines
Class 11
Gas reactorsthermal processorspyrophoritic conditioners and gas separators al/for the treatmentpurification and disposal of solidliquid and gaseous matterwater purification unitswater treatment equipmentmachines and equipment for treating water that has been used as part of the manufacture of semiconductors in order to remove any poisonous/noxious substances from the watergas scrubbershigh frequencymicrowave and DC torch plasma gas scrubbers; gas reactorsthermal processorspyrophoritic conditioners and gas separators and for use in exhaust gas abatement; gas burners for burning exhaust gases; gas igniters for igniting exhaust gasesgas heaters for heating exhaust gases; gas scrubbers for cleaning exhaust gases from the semiconductor industry and related fieldsintegrated gas pumping and scrubbing apparatus/machines for pumping and scrubbing exhaust gases; gas separatorspressure swing absorption separators for the separation of specific gases from an exhaust stream; gas recovery machinesmachines for the recovery of gaseous precursors and noble gases from the semiconductor industry and related fieldswet scrubbers for scrubbing water soluble gases from an exhaust stream and removing particulates from an exhaust stream; water cooled trapsheated traps and filter traps for the collection and/or removal of semiconductor process exhaust products; gas reactors for use in the semiconductor field or related fieldsapparatus for controlling the temperature of exhaust gas pipesliquid-cooled chillers for the promotion and/or prevention of condensation of semiconductor process by-products
Class 37
Repair and maintenance of semiconductor processing equipmentexhaust gas management systemschemical distribution systemswater treatment systemsheat exchangersvacuum apparatus and vacuum pumps and parts and fittings thereforrefurbishment of semiconductor processing equipment; consulting and advisory services in the fields of installation and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Class 40
Custom manufacturing consultancy and advisory services for othersall regarding manufacturing-related modifications to apparatuses that provide gasesgas mixtureschemicalsvacuum and exhaust management during the manufacture of semiconductors and semiconductor devices
Class 41
Arranging of educational seminars in the field of vacuum and exhaust management engineering; Training services in the field of designinstallationmodificationcalibrationoperationapplication and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Class 42
Engineering consultancy and advisory servicesall in the field of calibration of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in the manufacture of semiconductors and similar devices; design consultancy and advisory servicesall in the field of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in manufacturing semiconductors and similar devices
Publications
History of USPTO decisions and trademark events.
65 publications found
EWOR
TEAS WITHDRAWAL AS DOMESTIC REPRESENTATIVE RECEIVED
12/05/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
12/05/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
12/05/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
12/05/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
12/05/2023
NREP
NEW REPRESENTATIVE AT IB RECEIVED
03/04/2023
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
09/30/2020
71AG
REGISTERED-SEC.71 ACCEPTED
09/30/2020
PARI
TEAS VOLUNTARY AMENDMENT RECEIVED
09/24/2020
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
07/21/2020
ES71
TEAS SECTION 71 RECEIVED
05/26/2020
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
06/08/2019
RNWL
INTERNATIONAL REGISTRATION RENEWED
11/02/2017
ADCH
CHANGE OF NAME/ADDRESS REC'D FROM IB
08/31/2017
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
06/28/2016
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
06/28/2016
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
06/06/2016
ES75
TEAS SECTION 71 & 15 RECEIVED
05/12/2016
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
02/11/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
09/13/2010
FIMP
FINAL DISPOSITION PROCESSED
09/13/2010
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
09/08/2010
R.PR
REGISTERED-PRINCIPAL REGISTER
06/08/2010
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
03/23/2010
PUBO
PUBLISHED FOR OPPOSITION
03/23/2010
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
03/12/2010
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
02/25/2010
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
02/25/2010
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
02/16/2010
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
02/12/2010
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
01/19/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
01/19/2010
ERFR
TEAS REQUEST FOR RECONSIDERATION RECEIVED
01/19/2010
GEA1
NOTIFICATION OF ACTION DENYING REQ FOR RECON E-MAILED
01/13/2010
GECD
ACTION DENYING REQ FOR RECON E-MAILED
01/13/2010
CNCF
ACTION CONTINUING FINAL - COMPLETED
01/13/2010
JURT
JURISDICTION RESTORED TO EXAMINING ATTORNEY
11/27/2009
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
11/25/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
11/25/2009
ERFR
TEAS REQUEST FOR RECONSIDERATION RECEIVED
11/24/2009
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
11/23/2009
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
11/23/2009
EXPI
EX PARTE APPEAL-INSTITUTED
11/20/2009
EXAF
EXPARTE APPEAL RECEIVED AT TTAB
11/20/2009
RECD
ACTION DENYING REQ FOR RECON MAILED
11/12/2009
CNCF
ACTION CONTINUING FINAL - COMPLETED
11/12/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
10/23/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/23/2009
PAPER RECEIVED
10/15/2009
CNFR
FINAL REFUSAL MAILED
04/22/2009
CNFR
FINAL REFUSAL WRITTEN
04/21/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
04/01/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
04/01/2009
ALIE
ASSIGNED TO LIE
04/01/2009
PAPER RECEIVED
03/31/2009
NREP
NEW REPRESENTATIVE AT IB RECEIVED
11/14/2008
RFNT
REFUSAL PROCESSED BY IB
10/17/2008
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
10/01/2008
RFRR
REFUSAL PROCESSED BY MPU
10/01/2008
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
10/01/2008
CNRT
NON-FINAL ACTION WRITTEN
09/30/2008
DOCK
ASSIGNED TO EXAMINER
09/26/2008
NWAP
NEW APPLICATION ENTERED
09/26/2008
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
09/25/2008
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