TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
12/05/2023
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Official data from USPTO
EDWARDS
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Active USPTO registrationType: CombinedOffice: United States
Quick snapshot
ST13
US500000079057964Class
4, 6, 7, 9, 11, 37, 40, 41, 42
Filing
79057964
Registration
3767531
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
53
Latest update
12/05/2023
Trademark type
Combined
Nice classes
4, 6, 7, 9, 11, 37, 40, 41, 42
Filing date
10/17/2007
Registration date
03/30/2010
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
06/02/2020
Last transaction
12/05/2023
Responsible office
United States Patent and Trademark Office
Status code
706
Official register
Principal Register
Drawing code
3
Owner type
11
Owner location
Burgess Hill, GB
Examiner
LOTT, MAUREEN DALL
Law office
M80
Current location
GENERIC WEB UPDATE
Mark description
The mark consists of the stylized word "EDWARDS" where the top left portion of a stylized "E" is separated from the rest of the letter "E", which is partially enclosed by a semi-ellipse.
Holders and representatives
Holders
Edwards Limited
Edwards Limited
Representatives
William S. Fultz Womble Bond Dickinson (US) LLP
Technical classification
Nice Classes
Class 4Class 6Class 7Class 9Class 11Class 37Class 40Class 41Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 4
Industrial oilsmineral oilssilicone oilssynthetic oils and perfluoropolyether oils; Industrial lubricants; Industrial greases; Industrial greasesgreases used as vacuum sealants
Class 6
METAL VACUUM FLANGE AND METAL VACUUM FLANGE FITTINGS; METAL CLAMPS; COMMERCIAL CONTAINERS OF METAL FOR TRANSPORTING SEMICONDUCTOR PROCESSING EQUIPMENT
Class 7
Vacuum pumpsoil sealed vacuum pumpsrotary vane pumpsoil sealed rotary pumpsoil sealed piston pumpsvacuum booster pumpsvacuum scroll pumpsdry vacuum pumpsliquid ring vacuum pumpsindustrial dry vacuum pumpsvacuum diaphragm pumpsjet pumpsturbo molecular pumpscompound molecular pumpsregenerative pumpssub-atmospheric vapour pumpsdiffusion pumpschemical pumping systems comprised of valvesvesselspipingfittingspositive displacement pumpsgauges and controllersvacuum pumps for vacuum shelf dryerssteam ejector pumpsall of the aforementioned goods for pumping gases; exhaust gas management apparatus and equipmentexhaust piping; valves being parts of machinesair admittance valvesleak detection valvesdiaphragm valvesball valvesisolation valvesbaffle and isolation valvesbacking/roughing valvesgate valvesbutterfly valvesvent valvescheck valvesgas ballast valvespneumatic shutter control valvessolenoid valvesall of the aforementioned valves for use in connection with pumping gases in vacuum systemssemiconductor and solar pane processes; vacuum deposition machines for deposition of films for use in semiconductor and solar panel processes
Class 9
Spectrograph apparatus; mass spectrometers; instruments and apparatus for use in testingcontroldetectionmonitoring and the analysis of materials in scientific and industrial operationsinfrared spectrometersultraviolet spectrometersparticle size analyzers and electrochemical sensors; pressure gauges; pressure regulators for use in scientific and industrial vacuum apparatus; leak detectors for fluid leaks in scientific and industrial vacuum systems or apparatus; ionization gauges for use in scientific and industrial vacuum apparatus and systems; magnetron gauges for use in scientific and industrial vacuum apparatus and systems; vacuum gauges for use in scientific and industrial vacuum apparatus and systems; convection gauges for use in scientific and industrial vacuum apparatus and systems; pirani gauges for use in scientific and industrial vacuum apparatus and systems; penning gauges for use in scientific and industrial vacuum apparatus and systems; ion gauges for use in scientific and industrial vacuum apparatus and systems; magnetron gauges for use in scientific and industrial vacuum apparatus and systems; inverted magnetron gauges for use in scientific and industrial vacuum apparatus and systems; wide range gauges for use in scientific and industrial vacuum apparatus and systems; thermocouple gauges for use in scientific and industrial vacuum apparatus and systems; strain gauges for use in scientific and industrial vacuum apparatus and systems; electroacoustic transducers; electrical controllers for gauges; capsule dial gauges for use in scientific and industrial vacuum apparatus and systems; gas sensors for measuring the concentration or presence of target gases in a gas stream; moisture sensors; calibration apparatusinstruments and equipment for the calibration of scientific and industrial vacuum apparatusvacuum instrumentation and vacuum equipment; electronic valves for controlling gas; computer software for monitoring system status and providing data relating to vacuumexhaust abatementchemical use and gas userelating to the manufacture of semiconductors and integrated circuits; computer software for designing and configuring gaschemicalvacuum and exhaust management systems machines; valveselectropneumatic control valves and electric and electronic valves for controlling gas in vacuum systemssemiconductor and solar panel processes
Class 11
Gas reactorsthermal processorspyrophoritic conditioners and gas separators all for the treatmentpurification and disposal of solidliquid and gaseous matter; water purification units; water treatment equipmentmachines and equipment for treating water that has been used as part of the manufacture of semiconductors in order to remove any poisonous/noxious substances from the water; gas scrubbers; high frequencymicrowave and DC torch plasma gas scrubbers; gas reactorsthermal processorspyrophoritic conditioners and gas separators all for use in exhaust gas abatement; gas burners for burning exhaust gases; gas igniters for igniting exhaust gases; gas heaters for heating exhaust gases; gas scrubbers for cleaning exhaust gases from the semiconductor industry and related fields; integrated gas pumping and scrubbing apparatus/machines for pumping and scrubbing exhaust gases; gas separatorspressure swing absorption separators for the separation of specific gases from an exhaust stream; gas recovery machinesmachines for the recovery of gaseous precursors and noble gases from the semiconductor industry and related fields; wet scrubbers for scrubbing water soluble gases from an exhaust stream and removing particulates from an exhaust stream; water cooled trapsheated traps and filter traps for the collection and/or removal of semiconductor process exhaust products; gas reactors for use in the semiconductor field or related fields; apparatus for controlling the temperature of exhaust gas pipesliquid-cooled chillers for the promotion and/or prevention of condensation of semiconductor process by-products
Class 37
Repair and maintenance of semiconductor processing equipmentexhaust gas management systemschemical distribution systemswater treatment systemsheat exchangersvacuum apparatus and vacuum pumps and parts and fittings therefor; refurbishment of semiconductor processing equipment; consulting and advisory services in the fields of installation and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Class 40
Custom manufacturing consultancy and advisory services for othersall regarding manufacturing-related modifications to apparatuses that provide gasesgas mixtureschemicalsvacuum and exhaust management during the manufacture of semiconductors and semiconductor devices
Class 41
Arranging of educational seminars in the field of vacuum and exhaust management engineering; Training services in the field of designinstallationmodificationcalibrationoperationapplication and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Class 42
Engineering consultancy and advisory servicesall in the field of calibration of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in the manufacture of semiconductors and similar devices; design consultancy and advisory servicesall in the field of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in manufacturing semiconductors and similar devices
Publications
History of USPTO decisions and trademark events.
53 publications found
EWOR
TEAS WITHDRAWAL AS DOMESTIC REPRESENTATIVE RECEIVED
12/05/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
12/05/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
12/05/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
12/05/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
12/05/2023
NREP
NEW REPRESENTATIVE AT IB RECEIVED
03/04/2023
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
06/02/2020
71AG
REGISTERED-SEC.71 ACCEPTED
06/02/2020
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
06/02/2020
ES71
TEAS SECTION 71 RECEIVED
03/04/2020
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
03/30/2019
RNWL
INTERNATIONAL REGISTRATION RENEWED
11/02/2017
ADCH
CHANGE OF NAME/ADDRESS REC'D FROM IB
08/31/2017
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
05/09/2016
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
05/09/2016
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
05/09/2016
ES75
TEAS SECTION 71 & 15 RECEIVED
03/29/2016
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
02/05/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
07/15/2010
FIMP
FINAL DISPOSITION PROCESSED
07/15/2010
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
06/30/2010
R.PR
REGISTERED-PRINCIPAL REGISTER
03/30/2010
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
03/12/2010
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
02/25/2010
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
02/25/2010
PUBO
PUBLISHED FOR OPPOSITION
01/12/2010
NPUB
NOTICE OF PUBLICATION
12/23/2009
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
12/04/2009
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
11/30/2009
CNEA
EXAMINERS AMENDMENT MAILED
11/23/2009
XAEC
EXAMINER'S AMENDMENT ENTERED
11/23/2009
CNEA
EXAMINERS AMENDMENT -WRITTEN
11/23/2009
CNFR
FINAL REFUSAL MAILED
11/13/2009
CNFR
FINAL REFUSAL WRITTEN
11/13/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
10/23/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/23/2009
PAPER RECEIVED
10/15/2009
CNRT
NON-FINAL ACTION MAILED
04/23/2009
CNRT
NON-FINAL ACTION WRITTEN
04/23/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
04/01/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
04/01/2009
ALIE
ASSIGNED TO LIE
04/01/2009
PAPER RECEIVED
03/31/2009
NREP
NEW REPRESENTATIVE AT IB RECEIVED
11/14/2008
RFNT
REFUSAL PROCESSED BY IB
10/31/2008
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
10/06/2008
RFRR
REFUSAL PROCESSED BY MPU
10/06/2008
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
10/04/2008
CNRT
NON-FINAL ACTION WRITTEN
10/03/2008
DOCK
ASSIGNED TO EXAMINER
09/26/2008
NWAP
NEW APPLICATION ENTERED
09/26/2008
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
09/25/2008
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