NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/11/2023
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Official data from USPTO
CEX
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Active USPTO registrationType: CombinedOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
50
Latest update
02/11/2023
Trademark type
Combined
Nice classes
9, 41, 42
Filing date
05/27/2008
Registration date
10/26/2010
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
05/07/2021
Last transaction
05/07/2021
Responsible office
United States Patent and Trademark Office
Status code
709
Official register
Principal Register
Drawing code
3
Owner type
99
Owner location
12489 Berlin, DE
Examiner
FINNEGAN, TIMOTHY
Law office
L40
Current location
GENERIC WEB UPDATE
Mark description
The mark consists of stylized letters "E" and "X", which are comprised of a block format for a non-capitalized letter "e" with the left-portion of the letter "x" adjacent the block letter "c" forming an internal arrow shaped space between the two letters.
Holders and representatives
Holders
Plasmetrex GmbH
Plasmetrex GmbH
Representatives
ROBERT CURCIO DeLIO, PETERSON & CURCIO, LLC
Technical classification
Nice Classes
Class 9Class 41Class 42
Vienna Codes
No Vienna codes available.
Goods and services
Class 9
Electric and electronic measuringcontrollingchecking and regulating apparatusincluded in this classsensors for process development and transfer for etch and low pressure depositionsensors for manufacturing control for etch and low pressure depositionsensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recordingtransmission or reproduction of soundimages and data; apparatus for the determination of process parameters in plasma processessensors for process development and transfer for etch and low pressure depositionsensors for manufacturing control for etch and low pressure depositionsensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition
Class 41
Education servicesproviding seminarstrainingcourses in the field of semiconductor processing and manufacturingradio frequency technology for plasma applications; providing of seminarstraining and courses in the field of semiconductor processing and manufacturingradio frequency technology for plasma applicationswafer damaginge-chuckarcingplasma nitridation of ultra SiO2 filmsconditioning and loading effects in plasma etching; publication of textsother than publicity textsincluding internet publication of texts
Class 42
Scientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturingradio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturingradio frequency technology for plasma applications
Publications
History of USPTO decisions and trademark events.
50 publications found
NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/10/2023
INNT
TOTAL INVALIDATION PROCESSED BY THE IB
07/11/2022
INTS
TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
05/06/2022
INPC
INVALIDATION PROCESSED
05/06/2022
INTR
TOTAL INVALIDATION OF REG EXT PROTECTION CREATED
01/07/2022
C71T
CANCELLED SECTION 71
05/07/2021
NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/26/2021
NREP
NEW REPRESENTATIVE AT IB RECEIVED
06/21/2019
RNWL
INTERNATIONAL REGISTRATION RENEWED
12/13/2018
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - MAILED
09/27/2016
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
09/27/2016
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
09/27/2016
ES75
TEAS SECTION 71 & 15 RECEIVED
08/25/2016
NREP
NEW REPRESENTATIVE AT IB RECEIVED
09/11/2015
NREP
NEW REPRESENTATIVE AT IB RECEIVED
01/03/2015
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
03/22/2013
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
02/17/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
02/02/2011
FIMP
FINAL DISPOSITION PROCESSED
02/02/2011
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
01/26/2011
R.PR
REGISTERED-PRINCIPAL REGISTER
10/26/2010
PUBO
PUBLISHED FOR OPPOSITION
08/10/2010
NPUB
NOTICE OF PUBLICATION
07/21/2010
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
07/08/2010
ALIE
ASSIGNED TO LIE
07/06/2010
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
06/30/2010
ACEC
AMENDMENT FROM APPLICANT ENTERED
06/09/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
06/09/2010
ALIE
ASSIGNED TO LIE
06/09/2010
PAPER RECEIVED
05/27/2010
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
01/14/2010
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
12/24/2009
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
12/24/2009
CNRT
NON-FINAL ACTION MAILED
11/24/2009
CNRT
NON-FINAL ACTION WRITTEN
11/23/2009
DOCK
ASSIGNED TO EXAMINER
11/03/2009
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
03/18/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
03/18/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
03/18/2009
ALIE
ASSIGNED TO LIE
03/18/2009
PAPER RECEIVED
03/16/2009
RFNT
REFUSAL PROCESSED BY IB
11/07/2008
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
09/17/2008
RFRR
REFUSAL PROCESSED BY MPU
09/17/2008
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
09/17/2008
CNRT
NON-FINAL ACTION WRITTEN
09/16/2008
DOCK
ASSIGNED TO EXAMINER
09/09/2008
NWAP
NEW APPLICATION ENTERED
07/25/2008
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
07/24/2008
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