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Official data from USPTO

EPICREW

Did you know this trademark is already registered in United States?

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Active USPTO registrationType: CombinedOffice: United States

Quick snapshot

EPICREW

ST13

US500000079027610

Class

7, 9, 37, 40, 41, 42

Filing

79027610

Registration

3405642

Risk and opportunity diagnosis

Executive reading for naming, filing, and monitoring decisions.

USPTO status

Active USPTO registration

Case type

Application and registration

Recorded events

61

Latest update

03/13/2026

Trademark type

Combined

Nice classes

7, 9, 37, 40, 41, 42

Filing date

04/17/2006

Registration date

04/01/2008

Expiration date

-

Complete case details

Structured fields from the responsible authority and the official record.

Status date

11/20/2018

Last transaction

03/13/2026

Responsible office

United States Patent and Trademark Office

Status code

707

Official register

Principal Register

Drawing code

3

Owner type

03

Owner location

Omura-City, Nagasaki, JP

Examiner

BROWNE, DAYNA

Law office

L40

Holders and representatives

Holders

E. C. (pessoa física)
E. C. (pessoa física)

Representatives

George H. Kobayashi MASUDA, FUNAI, EIFERT & MITCHELL, LTD.

Technical classification

Nice Classes

Class 7Class 9Class 37Class 40Class 41Class 42

Vienna Codes

No Vienna codes available.

Goods and services

Class 7

Industrial robots; Semiconductor manufacturing machines and their parts sold as a unit

Class 9

Cinematographic cameras; Cameras for photography; Optical condensers; Optical correcting lenses for cameras; Photography diaphragms; Microscopy diffraction apparatus; Photography filterslens filters; Camera lens hoods; Optical lenses for cameras; Scientific and technical apparatusoptical mirrors; Prisms; Stands for photographic apparatuscamera stands

Class 37

Semiconductor manufacturing machines and systems installationincluding cases of dispatch; Repair or maintenance of optical machines and instrumentsincluding cases of dispatch; Repair or maintenance of semiconductor manufacturing machines and systemsincluding cases of dispatch; Repair or maintenance of integrated circuitsmanufacturing machines and systemsincluding cases of dispatch

Class 40

Recycling of waste and trash; rental of metalworking machines and tools; rental of semiconductor manufacturing machines and systems

Class 41

Education and instruction servicestraining on the use of semiconductor manufacturing machines including their parts and systems including cases of dispatch; Education and instruction servicestraining on the use of cinematographic or photographic optical machines and instruments including cases of dispatch; Rental of optical machines and instrumentsrental of cinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for cameras

Class 42

Design of machinesapparatusinstrumentsincluding their partssystems composed of such machinesapparatus and instruments including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands; Technological advice relating to performance and operation of computersautomobiles and other machines that require high levels of personal knowledgeskill or experience of operators to meet the required accuracy in operating them including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands; Testing and research on machinesapparatus and instruments including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands

Publications

History of USPTO decisions and trademark events.

61 publications found

RNWL

INTERNATIONAL REGISTRATION RENEWED

03/12/2026

NREP

NEW REPRESENTATIVE AT IB RECEIVED

01/20/2023

INNP

PARTIAL INVALIDATION PROCESSED BY THE IB

10/25/2019

INPS

PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB

08/14/2019

INPC

INVALIDATION PROCESSED

08/14/2019

NREP

NEW REPRESENTATIVE AT IB RECEIVED

08/02/2019

INPR

PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED

07/20/2019

NA71

NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED

11/20/2018

71.P

REGISTERED - PARTIAL SEC 71 ACCEPTED

11/20/2018

EROP

TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED

11/20/2018

PR71

POST REGISTRATION ACTION MAILED - SEC.71

10/10/2018

NREP

NEW REPRESENTATIVE AT IB RECEIVED

10/05/2018

71AF

REGISTERED-SEC.71 FILED

09/28/2018

ES71

TEAS SECTION 71 RECEIVED

09/28/2018

RNWL

INTERNATIONAL REGISTRATION RENEWED

06/07/2018

REM4

COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED

04/01/2017

NREP

NEW REPRESENTATIVE AT IB RECEIVED

10/02/2015

NREP

NEW REPRESENTATIVE AT IB RECEIVED

04/09/2015

NA75

NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED

03/19/2014

C75A

REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.

03/19/2014

APRE

CASE ASSIGNED TO POST REGISTRATION PARALEGAL

03/19/2014

715F

REGISTERED - SEC. 71 & SEC. 15 FILED

02/26/2014

ES75

TEAS SECTION 71 & 15 RECEIVED

02/26/2014

FINO

FINAL DECISION TRANSACTION PROCESSED BY IB

12/22/2012

FICS

FINAL DISPOSITION NOTICE SENT TO IB

07/16/2008

FIMP

FINAL DISPOSITION PROCESSED

07/16/2008

FICR

FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB

07/03/2008

R.PR

REGISTERED-PRINCIPAL REGISTER

04/01/2008

OPNX

NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB

03/21/2008

OPNS

NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB

03/06/2008

OPNR

NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB

03/06/2008

PUBO

PUBLISHED FOR OPPOSITION

01/15/2008

NPUB

NOTICE OF PUBLICATION

12/26/2007

CNEA

EXAMINERS AMENDMENT MAILED

12/11/2007

PREV

LAW OFFICE PUBLICATION REVIEW COMPLETED

12/10/2007

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

12/10/2007

XAEC

EXAMINER'S AMENDMENT ENTERED

12/10/2007

CNEA

EXAMINERS AMENDMENT -WRITTEN

12/10/2007

ZZZX

PREVIOUS ALLOWANCE COUNT WITHDRAWN

12/10/2007

PBCR

WITHDRAWN FROM PUB - OG REVIEW QUERY

10/29/2007

PREV

LAW OFFICE PUBLICATION REVIEW COMPLETED

10/17/2007

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

10/16/2007

ACEC

AMENDMENT FROM APPLICANT ENTERED

10/15/2007

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

10/15/2007

MAIL

PAPER RECEIVED

10/12/2007

CNRT

NON-FINAL ACTION MAILED

05/30/2007

CNRT

NON-FINAL ACTION WRITTEN

05/29/2007

NREP

NEW REPRESENTATIVE AT IB RECEIVED

05/24/2007

ACEC

AMENDMENT FROM APPLICANT ENTERED

05/02/2007

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

05/02/2007

ALIE

ASSIGNED TO LIE

05/02/2007

MAIL

PAPER RECEIVED

04/03/2007

TCCA

TEAS CHANGE OF CORRESPONDENCE RECEIVED

03/27/2007

RFNT

REFUSAL PROCESSED BY IB

11/02/2006

RFCS

NON-FINAL ACTION MAILED - REFUSAL SENT TO IB

10/17/2006

RFRR

REFUSAL PROCESSED BY MPU

10/17/2006

RFCR

NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW

10/16/2006

CNRT

NON-FINAL ACTION WRITTEN

10/15/2006

DOCK

ASSIGNED TO EXAMINER

10/06/2006

NWAP

NEW APPLICATION ENTERED

10/06/2006

REPR

SN ASSIGNED FOR SECT 66A APPL FROM IB

10/05/2006

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