RNWL
INTERNATIONAL REGISTRATION RENEWED
12/04/2025
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Official data from USPTO
ZERODUR
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: WordOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
60
Latest update
12/05/2025
Trademark type
Word
Nice classes
7, 9
Filing date
03/17/2006
Registration date
09/30/2008
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
09/14/2018
Last transaction
12/05/2025
Responsible office
United States Patent and Trademark Office
Status code
706
Official register
Principal Register
Drawing code
4
Owner type
99
Owner location
55122 Mainz, DE
Examiner
COWARD,KATHRYN E
Law office
M60
Current location
GENERIC WEB UPDATE
Holders and representatives
Holders
SCHOTT AG
Representatives
Merry L. Biggerstaff Jennifer Silverman PLLC
Technical classification
Nice Classes
Class 7Class 9
Vienna Codes
No Vienna codes available.
Goods and services
Class 7
High-precision components made of glass ceramics with low expansion for the exact dimensioning of machine constructions for use in mechanical engineeringcomponents used in the engineering and machining of orbital telescopes used in astronomysilicon waferssteppersscannersmeasuring instruments used in laboratories and optical instruments
Class 9
Mirror holders made of glass ceramics for concaveconvexplane optical mirrors; translucent optical components made of glass ceramics for the testing of astronomical mirror holdersmandrel material for the shaping of mirror shells in x-ray telescopes and mirror substrates of earthbound and orbital telescopes; high-precision mechanical components made of glass ceramics with low expansion for laboratory apparatus for the exact dimensioning of laboratory constructionsfor use in laboratory measuring instruments; high-precision mechanical components made of glass ceramics with low expansion for the exact dimensioning of lithographical apparatus for use in lithography and micro-lithographymovable mechanical parts in silicon wafer stepper and scanner machines for wafer positioningsubstrate material for reflective optics in EUV lithography; high-precision mechanical components made of glass ceramics with low expansion for the exact dimensioning of laser apparatus for use in laser technologyhigh-precision opto-mechanical components made of glass ceramics with low expansion used in opto-mechanical technology in the field of space explorationhigh-precision components made of glass ceramics with low expansion for measurement technologygyroscopes and carriers for length scales
Publications
History of USPTO decisions and trademark events.
60 publications found
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
05/08/2024
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
05/08/2024
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
05/08/2024
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
05/08/2024
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
05/08/2024
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
05/08/2024
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
09/14/2018
71AG
REGISTERED-SEC.71 ACCEPTED
09/14/2018
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
09/14/2018
ES71
TEAS SECTION 71 RECEIVED
08/29/2018
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
09/30/2017
RNWL
INTERNATIONAL REGISTRATION RENEWED
06/09/2016
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
05/10/2014
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
05/10/2014
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
05/10/2014
715F
REGISTERED - SEC. 71 & SEC. 15 FILED
04/14/2014
ES75
TEAS SECTION 71 & 15 RECEIVED
04/14/2014
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
01/05/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
01/16/2009
FIMP
FINAL DISPOSITION PROCESSED
01/16/2009
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
12/30/2008
R.PR
REGISTERED-PRINCIPAL REGISTER
09/30/2008
PUBO
PUBLISHED FOR OPPOSITION
07/15/2008
NPUB
NOTICE OF PUBLICATION
06/25/2008
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
06/11/2008
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
06/09/2008
ZZZX
PREVIOUS ALLOWANCE COUNT WITHDRAWN
06/09/2008
PBCR
WITHDRAWN FROM PUB - OG REVIEW QUERY
05/05/2008
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
04/24/2008
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
04/23/2008
CNEA
EXAMINERS AMENDMENT MAILED
04/18/2008
XAEC
EXAMINER'S AMENDMENT ENTERED
04/18/2008
CNEA
EXAMINERS AMENDMENT -WRITTEN
04/18/2008
ACEC
AMENDMENT FROM APPLICANT ENTERED
02/13/2008
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
02/13/2008
PAPER RECEIVED
02/11/2008
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
02/07/2008
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
01/24/2008
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
01/24/2008
RECG
ACTION GRANTING REQ. FOR RECON. MAILED
01/11/2008
CNCF
ACTION CONTINUING FINAL - COMPLETED
01/11/2008
ACEC
AMENDMENT FROM APPLICANT ENTERED
11/27/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
11/27/2007
ALIE
ASSIGNED TO LIE
11/25/2007
PAPER RECEIVED
11/21/2007
CNFR
FINAL REFUSAL MAILED
05/18/2007
CNFR
FINAL REFUSAL WRITTEN
05/18/2007
ACEC
AMENDMENT FROM APPLICANT ENTERED
04/19/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
04/19/2007
ALIE
ASSIGNED TO LIE
04/19/2007
PAPER RECEIVED
03/15/2007
RFNT
REFUSAL PROCESSED BY IB
09/29/2006
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
09/12/2006
RFRR
REFUSAL PROCESSED BY MPU
09/12/2006
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
09/09/2006
CNRT
NON-FINAL ACTION WRITTEN
09/08/2006
DOCK
ASSIGNED TO EXAMINER
09/01/2006
NWAP
NEW APPLICATION ENTERED
08/25/2006
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
08/24/2006
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