NA89
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
09/13/2021
Back to search
Official data from USPTO
VEM
Did you know this trademark is already registered in United States?
Before investing in name, identity, and promotion, validate collision risk and registration strategy to avoid wasting time and budget.
Active USPTO registrationType: CombinedOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
44
Latest update
09/13/2021
Trademark type
Combined
Nice classes
1, 6
Filing date
07/23/2009
Registration date
05/17/2011
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
09/13/2021
Last transaction
09/13/2021
Responsible office
United States Patent and Trademark Office
Status code
800
Official register
Principal Register
First use anywhere
02/29/1988
First use in commerce
02/29/1988
Drawing code
5
Owner type
03
Owner location
Santa Clara, CA, US
Examiner
BEN, LINDSEY HEATHER
Law office
L80
Current location
GENERIC WEB UPDATE
Mark description
The mark consists of the letters "VEM", with a horizontal space separating the top portion of the right side of the "V", the "E" and the "M" from the bottom portion; the top of the "E" extends over the top of the right side of the "V".
Holders and representatives
Holders
Vacuum Engineering & Materials Co., Inc.
Vacuum Engineering & Materials Co., Inc.
Representatives
Grace Han Stanton PERKINS COIE LLP
Technical classification
Nice Classes
Class 1Class 6
Vienna Codes
No Vienna codes available.
Goods and services
Class 1
Oxides and carbides in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of oxides and carbides bonded with oxides and carbides used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics
Class 6
Titanium aluminumtungsten titaniumaluminum siliconaluminum silicon copperaluminum coppergold tingold germaniumgold nickeliron hafniumiron zirconiumcobalt iron tantalumnickel chromium silicontungsten silicon alloyscermetsrefractory compoundsrefractory blocks of metalrefractory shapes of metalfired refractory materials of metal in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of metal bonded with titanium aluminumtungsten titaniumaluminum siliconaluminum silicon copperaluminum coppergold tingold germaniumgold nickeliron hafniumiron zirconiumcobalt iron tantalumnickel chromium silicontungsten silicon alloyscermetsrefractory compoundsrefractory blocks of metalrefractory shapes of metalfired refractory materials of metal used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; Precious and semi-precious metals in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of precious and semi-precious metals bonded with precious and semi-precious metals used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics
Publications
History of USPTO decisions and trademark events.
44 publications found
RNL1
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
09/13/2021
89AG
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
09/13/2021
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
09/13/2021
E89R
TEAS SECTION 8 & 9 RECEIVED
05/12/2021
REM2
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
05/17/2020
NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
12/13/2017
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
12/13/2017
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
12/13/2017
E815
TEAS SECTION 8 & 15 RECEIVED
11/17/2017
R.PR
REGISTERED-PRINCIPAL REGISTER
05/17/2011
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
03/01/2011
PUBO
PUBLISHED FOR OPPOSITION
03/01/2011
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
01/26/2011
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
01/24/2011
XAEC
EXAMINER'S AMENDMENT ENTERED
01/24/2011
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
01/24/2011
GNEA
EXAMINERS AMENDMENT E-MAILED
01/24/2011
CNEA
EXAMINERS AMENDMENT -WRITTEN
01/24/2011
ZZZX
PREVIOUS ALLOWANCE COUNT WITHDRAWN
01/24/2011
PBCR
WITHDRAWN FROM PUB - OG REVIEW QUERY
01/21/2011
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
01/13/2011
ALIE
ASSIGNED TO LIE
01/12/2011
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
12/16/2010
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
11/24/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
11/24/2010
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
11/24/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
05/24/2010
GNRT
NON-FINAL ACTION E-MAILED
05/24/2010
CNRT
NON-FINAL ACTION WRITTEN
05/24/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
05/21/2010
GNRT
NON-FINAL ACTION E-MAILED
05/21/2010
CNRT
NON-FINAL ACTION WRITTEN
05/21/2010
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
05/01/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
04/30/2010
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
04/30/2010
DOCK
ASSIGNED TO EXAMINER
01/06/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
10/30/2009
GNRT
NON-FINAL ACTION E-MAILED
10/30/2009
CNRT
NON-FINAL ACTION WRITTEN
10/30/2009
DOCK
ASSIGNED TO EXAMINER
10/26/2009
MPMK
NOTICE OF PSEUDO MARK MAILED
07/28/2009
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
07/27/2009
NWAP
NEW APPLICATION ENTERED
07/27/2009
Continuous trademark protection
Get notified about every new filing that threatens VEM or your mark.
Professional 24-month watch service: we monitor USPTO for you and alert you in time to oppose — before conflicts become losses.