TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
04/06/2026
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Official data from USPTO
EPOCH
Did you know this trademark is already registered in United States?
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Active USPTO registrationType: CombinedOffice: United States
Risk and opportunity diagnosis
Executive reading for naming, filing, and monitoring decisions.
USPTO status
Active USPTO registration
Case type
Application and registration
Recorded events
47
Latest update
04/07/2026
Trademark type
Combined
Nice classes
1, 3
Filing date
11/09/2006
Registration date
06/24/2008
Expiration date
-
Complete case details
Structured fields from the responsible authority and the official record.
Status date
06/01/2018
Last transaction
04/07/2026
Responsible office
United States Patent and Trademark Office
Status code
800
Official register
Principal Register
First use anywhere
09/01/2006
First use in commerce
10/24/2006
Drawing code
3
Owner type
03
Owner location
Billerica, MA, US
Examiner
CORWIN, KEVIN SCOTT
Law office
M30
Current location
GENERIC WEB UPDATE
Mark description
The mark consists of the word "EPOCH" in capital letters and a crescent swish in the background.
Holders and representatives
Holders
ENTEGRIS, INC.
CMC MATERIALS TAIWAN CO., LTD.
Epoch Material Co., Ltd.
Representatives
Cynthia Johnson Walden Fish & Richardson P.C.
Technical classification
Nice Classes
Class 1Class 3
Vienna Codes
No Vienna codes available.
Goods and services
Class 1
Chemical solutions for use in the manufacturing and processing of semiconductorsphotoresist stripperbenotriazole (BTA)L-Proline solution
Class 3
Chemical mechanical polishing (CMP) slurry and Chemical mechanical planarization (CMP) slurry for use in the manufacturing and processing of semiconductors in the opto-electronics and photonics industries; Chemical mechanical polishing slurry for Liquid Crystal Display (LCD)Organic Light Emitting Diodes (O-LED)Light Emitting Diode (LED)Glass ThinningHard Disk; Abrasive compounds for lapping and polishing semiconductorssilicon wafersglass and metal surfaces; Cleaner for use in electronics industry; Pad cleaning solution for use in the manufacturing and processing of semiconductors; Post-Copper chemical mechanical planarization (CMP) cleaning solution for use in the manufacturing and processing of semiconductors; Cleaning solution for processing of Integrated Circuit (IC) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors
Publications
History of USPTO decisions and trademark events.
47 publications found
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
04/06/2026
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
04/06/2026
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
04/06/2026
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
04/06/2026
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
12/20/2023
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
08/09/2023
EWOR
TEAS WITHDRAWAL AS DOMESTIC REPRESENTATIVE RECEIVED
08/09/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
08/09/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
08/09/2023
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
08/02/2023
ASCK
ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY
07/20/2022
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
07/20/2022
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
03/03/2021
ASCK
ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY
11/21/2018
NA89
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
06/02/2018
RNL1
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
06/01/2018
89AG
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
06/01/2018
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
06/01/2018
E89R
TEAS SECTION 8 & 9 RECEIVED
05/23/2018
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
05/23/2018
REM2
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
06/24/2017
NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
11/08/2014
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
11/08/2014
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/08/2014
E815
TEAS SECTION 8 & 15 RECEIVED
10/28/2014
R.PR
REGISTERED-PRINCIPAL REGISTER
06/24/2008
PUBO
PUBLISHED FOR OPPOSITION
04/08/2008
NPUB
NOTICE OF PUBLICATION
03/19/2008
PBCR
WITHDRAWN FROM PUB - OG REVIEW QUERY
09/04/2007
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
08/17/2007
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
08/17/2007
XAEC
EXAMINER'S AMENDMENT ENTERED
08/04/2007
ALIE
ASSIGNED TO LIE
08/04/2007
XAEC
EXAMINER'S AMENDMENT ENTERED
08/03/2007
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
08/03/2007
GNEA
EXAMINERS AMENDMENT E-MAILED
08/03/2007
CNEA
EXAMINERS AMENDMENT -WRITTEN
08/03/2007
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
07/31/2007
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
07/13/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
07/13/2007
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
07/13/2007
GNRT
NON-FINAL ACTION E-MAILED
03/28/2007
CNRT
NON-FINAL ACTION WRITTEN
03/28/2007
DOCK
ASSIGNED TO EXAMINER
03/16/2007
MDSC
NOTICE OF DESIGN SEARCH CODE MAILED
11/16/2006
NWAP
NEW APPLICATION ENTERED
11/15/2006
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