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Dado oficial do USPTO

MCSS MC CHEMICAL SOLUTIONS FOR SEMICONDUCTOR

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Active USPTO registrationTipo: MistaEscritório: US

Snapshot rápido

MCSS MC CHEMICAL SOLUTIONS FOR SEMICONDUCTOR

ST13

US500000090645253

Classe

1, 19, 37, 40, 42

Pedido

90645253

Registro

6868895

Diagnóstico de risco e oportunidade

Leitura executiva para decisão de naming, protocolo e monitoramento.

Atenção: há risco ativo

Situação USPTO

Active USPTO registration

Tipo de processo

Pedido e registro

Eventos registrados

20

Atualização mais recente

11/10/2022

Classificação

Registrada

Tipo de marca

Mista

Classes Nice

1, 19, 37, 40, 42

Data de depósito

14/04/2021

Data de registro

11/10/2022

Data de expiração

-

Ação recomendada

Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.

Próximo passo

Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.

Dados completos do processo

Campos estruturados da autoridade responsável e do histórico oficial.

Data da situação

11/10/2022

Última transação

11/10/2022

Escritório responsável

United States Patent and Trademark Office

Código da situação

700

Cadastro oficial

Principal Register

Fundamento do pedido

Foreign priority

Código do desenho

5

Tipo de titular

03

Localização do titular

Tokyo, JP

Examinador

QUEEN, ESTHER FELICIA

Unidade examinadora

M20

Localização atual

PUBLICATION AND ISSUE SECTION

Descrição da marca

The mark consists of the wording "MCSS" in blue stylized font stacked over the wording "MC Chemical Solutions for Semiconductor" in black stylized font.

Titulares e representantes

Titulares

M. C. (pessoa física)

Representantes

Charles T. J. Weigell FROSS ZELNICK LEHRMAN & ZISSU, P.C.

Classificação técnica

Classes Nice

Classe 1Classe 19Classe 37Classe 40Classe 42

Códigos Vienna

Sem códigos Vienna disponíveis.

Produtos e serviços

Classe 1

Chemicals for use in industry and science; industrial chemicals; silicon dioxide; etching solutions for silicon compounds and metal; etching gels for industrial purposes; etching agentsetching mordants being acids and alkaline; surface active compounds for general use in the industrial artsas wettingspreadingemulsifyingdispersingpenetratingsmoothinglevelinganti-static and surface treating agents; anti-static preparationsother than for household purposes; water-soluble and electroconductive polymerspolymer compositions used in the manufacture of commercial and industrial goods; water-soluble and electroconductive polymer base compositionspolymer compositions used in the manufacture of commercial and industrial goods; unprocessed polymers; electroconductive polymerspolymer compositions used in the manufacture of commercial and industrial goods; electroconductive polymers for electronic materialspolymer compositions used in the manufacture of commercial and industrial goods; unprocessed plastics; photosensitive polymers for photoresist materials; photoresists; silicon dioxide powders; industrial chemicals made from SiO2; etchants for use in the manufacture of semiconductors; hydrochloric acid; nitric acid; ammonia water; sulfuric acid; hydrogen peroxide for industrial purposes; detergents for use in manufacturing processes; detergents for semiconductor wafers for use in semiconductor manufacturing processes; unprocessed plastics containing carbon nanotube; unprocessed polycarbonate resins containing carbon nanotube

Classe 19

Non-metallic minerals for building or construction; quartz

Classe 37

Repair or maintenance of electronic machines and apparatus; repair or maintenance of integrated circuits manufacturing machines and systems; repair or maintenance of semiconductor manufacturing machines and systems; repair and maintenance of vacuum pumps; cleaning of metals; cleaning of semiconductors; cleaning of semiconductor wafers; cleaning of ceramics; applying of resin coating for others; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to glass and quartz; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastic componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramic componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to glass componentsin particular the surfaces thereof; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to metal surfaces; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastics; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to plastic surfaces; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramics; applying protectivewear-resistantinsulativechemical resistantlow dust attracting and plasma resistant coatings to ceramic surfaces

Classe 40

Treatment of metals; treatment of surfaces of metals; processing of semiconductors; processing of semiconductors in the nature of treatment of semiconductors; manufacturing processing of semiconductor wafers; processing of semiconductor wafers; processing of semiconductor wafers in the nature of treatment of semiconductor wafers; custom assembling of semiconductors and integrated circuits; custom manufacturing and assembling of semiconductorswafers and integrated circuits; processing of alumite; grinding; abrasive blasting services; sand blasting services; shot blasting services; grit blasting services; dry ice blasting services; processing of quartz; nickel plating; treatment of metal materials; treatment of plastic materials; treatment of ceramic materials; heat treatment and coating of surfaces of high-vacuum installationshandling systemsincluding steppers for semiconductor manufacturingcomponents for the aforesaid installations and systemsthe aforesaid installations and systems in particular for the manufacture of semiconductors and semiconductor elements; heat treatment and coating of surfaces of high-vacuum installations and handling systems including steppers for semiconductor manufacturing; heat treatment and coating of surfaces of components for high-vacuum installations and handling systems including steppers for semiconductor manufacturing; heat treatment and coating of surfaces of high-vacuum installations and handling systems in particular for the manufacture of semiconductors and semiconductor elements; heat treatment and coating of surfaces of components for high-vacuum installations and handling systems in particular for the manufacture of semiconductors and semiconductor elements; processing of plastic resins; processing of artificial and epoxy resins; processing of synthetic plastic resins; custom processing in the nature of treatment of synthetic resins and metals; recycling of silicon wafers; recycling of used parts for use in semiconductor manufacturing processes; metal plating; electroplating; electroless plating; electroplating of wafers; electroless plating of wafers; assembly of metal products for others; providing thermal spraying treatment services for treating the surface of semiconductor manufacturing and processing equipment and the internal parts in order to form a coating over surface of the equipment and the internal parts during the semiconductor manufacturing and processing under customer consignment and specifications

Classe 42

Materials testing and analysisquality control inspectionresearch on metals; testing and analysis and evaluation of semiconductor wafers; research and development of plating methods; research and development services relating to solar cells and electricity generation

Publicações

Histórico de despachos e eventos da marca no USPTO.

20 publicações encontradas

NRCC

NOTICE OF REGISTRATION CONFIRMATION EMAILED

11/10/2022

R.PR

REGISTERED-PRINCIPAL REGISTER

11/10/2022

NPUB

OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED

26/07/2022

PUBO

PUBLISHED FOR OPPOSITION

26/07/2022

NONP

NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED

06/07/2022

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

22/06/2022

XAEC

EXAMINER'S AMENDMENT ENTERED

21/06/2022

GNEN

NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED

21/06/2022

GNEA

EXAMINERS AMENDMENT E-MAILED

21/06/2022

CNEA

EXAMINERS AMENDMENT -WRITTEN

21/06/2022

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

15/06/2022

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

15/06/2022

ALIE

ASSIGNED TO LIE

14/06/2022

TROA

TEAS RESPONSE TO OFFICE ACTION RECEIVED

07/06/2022

GNRN

NOTIFICATION OF NON-FINAL ACTION E-MAILED

08/12/2021

GNRT

NON-FINAL ACTION E-MAILED

08/12/2021

CNRT

NON-FINAL ACTION WRITTEN

08/12/2021

DOCK

ASSIGNED TO EXAMINER

06/12/2021

NWOS

NEW APPLICATION OFFICE SUPPLIED DATA ENTERED

22/07/2021

NWAP

NEW APPLICATION ENTERED

17/04/2021

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