REM1
COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
30/06/2025
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Dado oficial do USPTO
ADVANCED SURFACE CREATION
Sabia que essa marca já está registrada no Estados Unidos?
Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.
Active USPTO registrationTipo: VerbalEscritório: US
Snapshot rápido
ADVANCED SURFACE CREATION
ST13
US500000088588347Classe
1, 3, 7
Pedido
88588347
Registro
6089093
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
21
Atualização mais recente
01/07/2025
Classificação
Registrada
Tipo de marca
Verbal
Classes Nice
1, 3, 7
Data de depósito
22/08/2019
Data de registro
30/06/2020
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
30/06/2020
Última transação
01/07/2025
Escritório responsável
United States Patent and Trademark Office
Código da situação
700
Cadastro oficial
Principal Register
Código do desenho
4
Tipo de titular
03
Localização do titular
OSAKA, JP
Examinador
BELLO, ZACK
Unidade examinadora
M20
Localização atual
TMO LAW OFFICE 111
Titulares e representantes
Titulares
N. I. (pessoa física)
N. I. (pessoa física)
Representantes
Helen Hill Minsker Banner & Witcoff, Ltd.
Classificação técnica
Classes Nice
Classe 1Classe 3Classe 7
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 1
Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals
Classe 3
Polishing pads; abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing cloth; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations
Classe 7
Work holding instruments for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank components for semiconductor wafer surface polishing machines and apparatus; mounting films for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting films for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting films for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting films for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting films for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus
Publicações
Histórico de despachos e eventos da marca no USPTO.
21 publicações encontradas
A7OK
AMENDMENT UNDER SECTION 7 - PROCESSED
23/11/2020
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
20/11/2020
ES7R
TEAS SECTION 7 REQUEST RECEIVED
30/07/2020
ASGN
AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
15/07/2020
R.PR
REGISTERED-PRINCIPAL REGISTER
30/06/2020
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
14/04/2020
PUBO
PUBLISHED FOR OPPOSITION
14/04/2020
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
25/03/2020
FIXD
ELECTRONIC RECORD REVIEW COMPLETE
11/03/2020
ERRR
ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED
06/03/2020
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
01/03/2020
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
06/02/2020
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
06/02/2020
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
06/02/2020
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
01/12/2019
GNRT
NON-FINAL ACTION E-MAILED
01/12/2019
CNRT
NON-FINAL ACTION WRITTEN
01/12/2019
DOCK
ASSIGNED TO EXAMINER
22/11/2019
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
06/09/2019
NWAP
NEW APPLICATION ENTERED
26/08/2019
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