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Dado oficial do USPTO

AE

Sabia que essa marca já está registrada no Estados Unidos?

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Active USPTO registrationTipo: MistaEscritório: US

Snapshot rápido

AE

ST13

US500000088510050

Classe

1, 7, 40, 42

Pedido

88510050

Registro

6342345

Diagnóstico de risco e oportunidade

Leitura executiva para decisão de naming, protocolo e monitoramento.

Atenção: há risco ativo

Situação USPTO

Active USPTO registration

Tipo de processo

Pedido e registro

Eventos registrados

47

Atualização mais recente

05/05/2026

Classificação

Registrada

Tipo de marca

Mista

Classes Nice

1, 7, 40, 42

Data de depósito

11/07/2019

Data de registro

04/05/2021

Data de expiração

-

Ação recomendada

Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.

Próximo passo

Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.

Dados completos do processo

Campos estruturados da autoridade responsável e do histórico oficial.

Data da situação

04/05/2021

Última transação

05/05/2026

Escritório responsável

United States Patent and Trademark Office

Código da situação

700

Cadastro oficial

Principal Register

Fundamento do pedido

Intent to use, Foreign priority

Primeiro uso

23/06/2011

Primeiro uso no comércio

23/06/2011

Código do desenho

5

Tipo de titular

03

Localização do titular

Kitchener, Ontario, CA

Examinador

CORWIN, KEVIN SCOTT

Unidade examinadora

M30

Localização atual

PUBLICATION AND ISSUE SECTION

Descrição da marca

The mark consists of an uppercase letter "A" below a lowercase letter "E".

Titulares e representantes

Titulares

Angstrom Engineering Inc.

Representantes

Susan M. Natland BAKER & HOSTETLER LLP

Classificação técnica

Classes Nice

Classe 1Classe 7Classe 40Classe 42

Códigos Vienna

Sem códigos Vienna disponíveis.

Produtos e serviços

Classe 1

Chemical source materials for the use in deposition systems for the deposition of thin films upon semiconductor waferssemiconductor chipsoptical componentsnanotechnology components in the manufacture of semi-conductorscomputer peripheralsmicroscopy equipmentimaging equipmentinterferometer instrumentsoptical instrumentslight emitting diode displaysmonitors and screensliquid crystal displaysmonitors and screensbatteriesphotovoltaic deviceswith the aforementioned chemical materials being derived from metalsnon-metalsceramicsoxidesnitridesorganic compounds and polymers

Classe 7

Physical and chemical vapor deposition systemscoating application machines used for sputter depositionelectron beam evaporationthermal evaporationion beam depositionion beam sputter depositionion assisted depositionpulsed laser depositionatomic layer deposition; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps used for thin film depositionetching and cleaning; deposition system components being parts of deposition machinerysubstrate tablesfixturing and carriersthermal evaporation sourcesdeposition boatsdeposition filaments and cruciblesmagnetron sputter sourceselectron beam evaporatorsnanoparticle generatorsion generatorsion acceleratorscharged particle generators for material coating and surface modification purposessample handling arms and robotsload lock chambersthin film thickness measurement equipmentoptical measurement equipmentprocess gas delivery and abatement equipmentvacuum valvesvacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation

Classe 40

Manufacturing of physical and chemical vapor deposition machinery systems to the order and specification of others; manufacturing vacuum equipment and systems used for thin film depositionetching and cleaning to the order and specification of others; manufacturing vacuum equipment and systems used for controlled environment and space simulation to the order and specification of others

Classe 42

Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film depositionetching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation; design and development of physical and chemical vapor deposition machinery systems; design and development of vacuum equipment and machinery systems used for thin film depositionetching and cleaning; design and development of vacuum equipment and machinery systems used for controlled environment and space simulation

Publicações

Histórico de despachos e eventos da marca no USPTO.

47 publicações encontradas

REM1

COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED

04/05/2026

TCCA

TEAS CHANGE OF CORRESPONDENCE RECEIVED

26/03/2026

ECDR

TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS

26/03/2026

ARAA

ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED

26/03/2026

REAP

TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED

26/03/2026

EWAF

TEAS WITHDRAWAL OF ATTORNEY RECEIVED-FIRM RETAINS

26/11/2025

TCCA

TEAS CHANGE OF CORRESPONDENCE RECEIVED

26/11/2025

ECDR

TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS

26/11/2025

ARAA

ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED

26/11/2025

REAP

TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED

26/11/2025

CHAN

APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED

26/11/2025

COAR

TEAS CHANGE OF OWNER ADDRESS RECEIVED

26/11/2025

R.PR

REGISTERED-PRINCIPAL REGISTER

04/05/2021

SUNA

NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED

02/04/2021

CNPR

ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED

01/04/2021

SUPC

STATEMENT OF USE PROCESSING COMPLETE

30/03/2021

AITU

CASE ASSIGNED TO INTENT TO USE PARALEGAL

29/03/2021

IUAF

USE AMENDMENT FILED

09/03/2021

EISU

TEAS STATEMENT OF USE RECEIVED

09/03/2021

NOAM

NOA E-MAILED - SOU REQUIRED FROM APPLICANT

29/09/2020

NPUB

OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED

04/08/2020

PUBO

PUBLISHED FOR OPPOSITION

04/08/2020

NONP

NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED

15/07/2020

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

27/06/2020

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

27/06/2020

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

27/06/2020

ALIE

ASSIGNED TO LIE

25/06/2020

ALIE

ASSIGNED TO LIE

15/06/2020

ERSI

TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED

11/06/2020

GNS3

NOTIFICATION OF LETTER OF SUSPENSION E-MAILED

19/05/2020

GNSL

LETTER OF SUSPENSION E-MAILED

19/05/2020

CNSL

SUSPENSION LETTER WRITTEN

19/05/2020

ZZZX

PREVIOUS ALLOWANCE COUNT WITHDRAWN

18/05/2020

PBMR

WITHDRAWN FROM PUB - MANAGING ATTORNEY REQUEST

18/05/2020

FIXD

ELECTRONIC RECORD REVIEW COMPLETE

12/05/2020

ERRR

ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED

08/05/2020

ALIE

ASSIGNED TO LIE

04/05/2020

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

27/04/2020

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

27/03/2020

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

26/03/2020

TROA

TEAS RESPONSE TO OFFICE ACTION RECEIVED

26/03/2020

GNRN

NOTIFICATION OF NON-FINAL ACTION E-MAILED

27/09/2019

GNRT

NON-FINAL ACTION E-MAILED

27/09/2019

CNRT

NON-FINAL ACTION WRITTEN

27/09/2019

DOCK

ASSIGNED TO EXAMINER

26/09/2019

NWOS

NEW APPLICATION OFFICE SUPPLIED DATA ENTERED

17/07/2019

NWAP

NEW APPLICATION ENTERED

15/07/2019

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