NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
18/09/2025
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Dado oficial do USPTO
SOLAYER
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Active USPTO registrationTipo: VerbalEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
27
Atualização mais recente
19/09/2025
Classificação
Registrada
Tipo de marca
Verbal
Classes Nice
7, 9, 42
Data de depósito
22/03/2018
Data de registro
21/05/2019
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
18/09/2025
Última transação
19/09/2025
Escritório responsável
United States Patent and Trademark Office
Código da situação
702
Cadastro oficial
Principal Register
Fundamento do pedido
Intent to use
Primeiro uso
03/07/2017
Primeiro uso no comércio
03/07/2017
Código do desenho
4
Tipo de titular
99
Localização do titular
Kesselsdorf, DE
Examinador
BHANOT, KAPIL
Localização atual
Historical data usage
Titulares e representantes
Titulares
Solayer GmbH
Representantes
Michael E. Robinson ROBINSON IP LAW, PLLC
Classificação técnica
Classes Nice
Classe 7Classe 9Classe 42
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 7
Machines for coating productsmachines for use in coating and surface treatment of parts for precision opticsdisplaysphotovoltaic modulesenergy-efficient glassautomotive and emerging industry application; equipment in the nature of plasma sourcesevaporatorsdeposition chambersvacuum pumpssubstrate carrierscarrier transport mechanisms and controllers for physical vapor depositionchemical vapor depositionplasma vapor depositionplasma enhanced deposition and atomic layer deposition for use on metalssemiconductors and dielectrics not for use in research; installations for processing metalssemiconductors and dielectrics in particular for processing these materials in a vacuumvacuum systems comprising deposition equipmentheating equipmentannealing equipment and structuring equipment for processing semiconductors not for use in research; machinery for transporting or processing or providing substrates for coating or surface treatmenttransportation systems comprised of motor drivesrollersconveyor beltscarriersion sourcesplasma sourcesevaporatorssputter sourceselectrical and optical process monitorsflash lamp annealing modules; machines and machine componentschemical and physical processing equipment in the nature of Vacuum Physical Vapor Deposition (PVD) machinesVacuum Plasma Activated Chemical Vapor Deposition (PACVD) machinesion and plasma treating equipment in the nature of Plasma Cleaning Systems comprised of a plasma source and cleaning chamberIon Beam Cleaning Systems comprised of an ion source and cleaning chamber all of the foregoing for treating metallicsemiconductivedielectric substrates in a vacuum and process gas atmosphere for manufacturing thin coatings and surface treated substrates; equipment for the vaporization of materials for the production of the aforesaid coatingsequipment for evaporationsputtering equipmentheating equipment for vaporizing various materials in the nature of metalsoxidesnitridessemiconductorsorganic precursors all sold as a component of coating machines for use in coating solar cells and glass
Classe 9
Gas flow meterselectric voltage transformerscurrent converters for monitoringcontrolling and regulating pressuregas flowvoltagecurrentpowerplasma emission spectrumtemperaturefor measurement of substrate outputfilm thicknesselectric conductivityoptical transmissionoptical reflectivitycomputingmonitoring and regulating equipment for controlling the aforementioned measurements during the coating process; vacuum coating apparatus for coating substratesa vacuum vesselvacuum pumpsa glass substrate loading mechanisma glass substrate carriera carrier transportation mechanism and controllers all of the foregoing as components of glass coating machines; laboratory apparatus for substrate storage and transportglass substrate carriersglass substrate driers for laboratory purposes; substrates carrying an electrically conducting layer on one or two facescoated glass for architecture purposes and mirrorsall of the foregoing sold as a feature of photovoltaic modules; magnetron sputtering systems for machines for thin-film coating comprised of a vesselcathodesa substrate holdermeans for transportation of the substrate through the vesselmotorsmotor drivesrotary motion vacuum feedthroughstoothed beltschainswheels and controllers; parts and components for the manufacture and processing of materials and elements made from ultra-pure substancesin particular fabrication of parts for precision optics and semiconductor industrypumpsfilterspurging circuitstransfer chambersultra-pure sputter targetsultra-pure gas sources all sold as a component of fabrication equipment for the production of energy
Classe 42
Engineering services in the field of thin film technology and surface treatment
Publicações
Histórico de despachos e eventos da marca no USPTO.
27 publicações encontradas
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
18/09/2025
PRAN
POST REGISTRATION ACTION MAILED NO RESPONSE REQUIRED
18/09/2025
PR23
POST REGISTRATION ACTION MAILED - SEC. 8 & 15
28/08/2025
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
28/08/2025
E815
TEAS SECTION 8 & 15 RECEIVED
22/04/2025
REM1
COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
21/05/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
21/05/2019
SUNA
NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED
13/04/2019
CNPR
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
12/04/2019
SUPC
STATEMENT OF USE PROCESSING COMPLETE
29/03/2019
AITU
CASE ASSIGNED TO INTENT TO USE PARALEGAL
29/03/2019
IUAF
USE AMENDMENT FILED
13/03/2019
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
13/03/2019
EISU
TEAS STATEMENT OF USE RECEIVED
13/03/2019
NOAM
NOA E-MAILED - SOU REQUIRED FROM APPLICANT
30/10/2018
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
04/09/2018
PUBO
PUBLISHED FOR OPPOSITION
04/09/2018
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
15/08/2018
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
10/07/2018
XAEC
EXAMINER'S AMENDMENT ENTERED
10/07/2018
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
10/07/2018
GNEA
EXAMINERS AMENDMENT E-MAILED
10/07/2018
CNEA
EXAMINERS AMENDMENT -WRITTEN
10/07/2018
DOCK
ASSIGNED TO EXAMINER
06/07/2018
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
29/03/2018
NWAP
NEW APPLICATION ENTERED
26/03/2018
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