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Dado oficial do USPTO

INFRASIL

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Active USPTO registrationTipo: VerbalEscritório: US

Snapshot rápido

INFRASIL

ST13

US500000087748890

Classe

9, 11, 21

Pedido

87748890

Registro

5683477

Diagnóstico de risco e oportunidade

Leitura executiva para decisão de naming, protocolo e monitoramento.

Atenção: há risco ativo

Situação USPTO

Active USPTO registration

Tipo de processo

Pedido e registro

Eventos registrados

24

Atualização mais recente

18/11/2025

Classificação

Registrada

Tipo de marca

Verbal

Classes Nice

9, 11, 21

Data de depósito

09/01/2018

Data de registro

26/02/2019

Data de expiração

-

Ação recomendada

Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.

Próximo passo

Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.

Dados completos do processo

Campos estruturados da autoridade responsável e do histórico oficial.

Data da situação

17/11/2025

Última transação

18/11/2025

Escritório responsável

United States Patent and Trademark Office

Código da situação

702

Cadastro oficial

Principal Register

Fundamento do pedido

Foreign priority

Código do desenho

4

Tipo de titular

16

Localização do titular

Hanau, DE

Examinador

WILKE, JOHN

Localização atual

Historical data usage

Titulares e representantes

Titulares

Heraeus Quarzglas GmbH & Co. KG
Heraeus Quarzglas GmbH & Co. KG

Representantes

Daniel M. Gurfinkel Dennemeyer & Associates, LLC

Classificação técnica

Classes Nice

Classe 9Classe 11Classe 21

Códigos Vienna

Sem códigos Vienna disponíveis.

Produtos e serviços

Classe 9

Measurement apparatus, namely, apparatus for determining the change in resistance of a material on irradiation with ultraviolet (UV) radiation and for detecting a radiation dose; scientific and technical apparatus, namely, optical windows, lenses, mirrors, prisms or reflectors of natural or synthetic quartz glass, for use in detectors for determining physical variables of electromagnetic waves, spectrometers, reflectometers, interferometers, laser cavities, installations for photolithographic laser cavities, installations for photolithographic structuring of a photoresist layer, in particular installations for photolithographic structuring of a photoresist layer in the manufacture of integrated circuits, installations for immersion lithography, installations for extreme ultraviolet lithography (EUV), in particular in installations for EUV lithography in the manufacture of integrated circuits, elements for coupling of pump light into active laser fibers, elements for coupling of laser light into passive transmission fibers, laser heads for focusing, shaping or positioning of a laser beam, in particular laser heads for focusing, shaping or positioning of a laser beam in industrial cutting and welding systems, connectors of passive laser cables, in particular for transmission of laser beams from the place of production to the place of use, vacuum chambers for modification of surfaces, in particular for vaporizing, hardening, sputtering or plasma etching of surfaces, in particular for LED manufacture, camera systems for telescopes, in particular which examine a wide wavelength range, including the near-infrared range, optics for laser fusion projects, camera systems for optical quality control or for control of positioning systems, in particular camera systems for optical quality control or for control of positioning systems which work within a wavelength range of 2000-3500 nm

Classe 11

Lighting apparatus, namely, lighting installations, lamps, arc lamps, germicidal burners for laboratory use, furnaces, other than for laboratory use, furnaces, other than for laboratory use, distillation apparatus not for scientific purposes, gas lamps, gas purification_ machines; Lighting systems and lighting devices for lighting systems for curing, cleaning or activating surfaces for preparing further process steps or for modifying surface structure, all the aforesaid steps in particular using ultraviolet (UV) radiation

Classe 21

Fused silica as a semi-worked product, other than for building, and semi-worked products made therefrom, namely, tubes, poles, plates, blocks; quartz glass bodies, namely, quartz glass and semi-finished quartz glass, namely, pipes, rods, plates, and blocks, preferably for lighting systems and lighting means for lighting systems, quarts glass vitreous silica fibers, not for textile use; Opaque quartz glass and opaque quartz glass fibers, not for textile use; Synthetic quartz glass and synthetic quartz glass fibers, not for textile use; Natural quartz glass and quartz glass fibers of natural quartz glass, not for textile use

Publicações

Histórico de despachos e eventos da marca no USPTO.

24 publicações encontradas

NA85

NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED

17/11/2025

C15A

REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.

17/11/2025

APRE

CASE ASSIGNED TO POST REGISTRATION PARALEGAL

17/11/2025

E815

TEAS SECTION 8 & 15 RECEIVED

31/07/2025

REM1

COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED

26/02/2024

ASCK

ASSIGNMENT OF OWNERSHIP NOT UPDATED AUTOMATICALLY

03/05/2023

R.PR

REGISTERED-PRINCIPAL REGISTER

26/02/2019

NPUB

OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED

11/12/2018

PUBO

PUBLISHED FOR OPPOSITION

11/12/2018

NONP

NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED

21/11/2018

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

07/11/2018

ACEC

AMENDMENT FROM APPLICANT ENTERED

05/11/2018

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

05/11/2018

ALIE

ASSIGNED TO LIE

26/10/2018

MAIL

PAPER RECEIVED

15/10/2018

GNS3

NOTIFICATION OF LETTER OF SUSPENSION E-MAILED

04/10/2018

GNSL

LETTER OF SUSPENSION E-MAILED

04/10/2018

CNSL

SUSPENSION LETTER WRITTEN

04/10/2018

GNRN

NOTIFICATION OF NON-FINAL ACTION E-MAILED

18/04/2018

GNRT

NON-FINAL ACTION E-MAILED

18/04/2018

CNRT

NON-FINAL ACTION WRITTEN

18/04/2018

DOCK

ASSIGNED TO EXAMINER

18/04/2018

NWOS

NEW APPLICATION OFFICE SUPPLIED DATA ENTERED

23/01/2018

NWAP

NEW APPLICATION ENTERED

12/01/2018

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