FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
23/11/2024
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Dado oficial do USPTO
LASERTEC
Sabia que essa marca já está registrada no Estados Unidos?
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Active USPTO registrationTipo: VerbalEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
38
Atualização mais recente
23/11/2024
Classificação
Registrada
Tipo de marca
Verbal
Classes Nice
7, 9
Data de depósito
26/10/2022
Data de registro
07/05/2024
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
07/05/2024
Última transação
07/05/2024
Escritório responsável
United States Patent and Trademark Office
Código da situação
700
Cadastro oficial
Principal Register
Código do desenho
4
Tipo de titular
03
Localização do titular
JP
Examinador
HUSSAIN, TASNEEM
Unidade examinadora
M90
Localização atual
FILE REPOSITORY (FRANCONIA)
Titulares e representantes
Titulares
L. C. (pessoa física)
Representantes
George W. Lewis WHDA, LLP
Classificação técnica
Classes Nice
Classe 7Classe 9
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 7
Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays
Classe 9
Semiconductor photomask optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatusoptical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatusoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatusoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amountoptical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatusoptical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatusoptical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatusoptical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatusoptical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatusoptical measurement system comprised of optical inspection apparatus for detectionmeasurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatusoptical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposessemiconductor testing apparatus; precision crystallographic measuring apparatus; data setsdownloadablein the field of semiconductors; computer softwarerecordedfor operating semiconductor photomaskreticle or pellicle optical inspection apparatus; computer software applicationsdownloadablefor operating semiconductor photomaskreticle or pellicle optical inspection apparatus; computer hardware; computer programsdownloadablefor operating semiconductor photomaskreticle or pellicle optical inspection apparatus
Publicações
Histórico de despachos e eventos da marca no USPTO.
38 publicações encontradas
FICS
FINAL DISPOSITION NOTICE SENT TO IB
03/11/2024
FIMP
FINAL DISPOSITION PROCESSED
02/11/2024
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
07/08/2024
NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
07/05/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
07/05/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
04/03/2024
GPNX
NOTIFICATION PROCESSED BY IB
26/02/2024
PUBO
PUBLISHED FOR OPPOSITION
20/02/2024
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
07/02/2024
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
07/02/2024
NREP
NEW REPRESENTATIVE AT IB RECEIVED
03/02/2024
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
01/02/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
31/01/2024
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
17/01/2024
XAEC
EXAMINER'S AMENDMENT ENTERED
02/01/2024
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
02/01/2024
GNEA
EXAMINERS AMENDMENT E-MAILED
02/01/2024
CNEA
EXAMINERS AMENDMENT -WRITTEN
02/01/2024
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
08/12/2023
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
07/12/2023
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
07/12/2023
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
20/07/2023
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
20/07/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
20/07/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
20/07/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
20/07/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
20/07/2023
RFNT
REFUSAL PROCESSED BY IB
11/07/2023
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
20/06/2023
RFRR
REFUSAL PROCESSED BY MPU
20/06/2023
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
11/05/2023
CNRT
NON-FINAL ACTION WRITTEN
10/05/2023
DOCK
ASSIGNED TO EXAMINER
09/05/2023
MAFR
APPLICATION FILING RECEIPT MAILED
28/01/2023
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
24/01/2023
LIMI
LIMITATION FROM ORIGINAL APPLICATION ENTERED
23/01/2023
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
19/01/2023
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