FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
23/11/2024
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Dado oficial do USPTO
LASERTEC
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Active USPTO registrationTipo: MistaEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
38
Atualização mais recente
23/11/2024
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
7, 9
Data de depósito
26/10/2022
Data de registro
07/05/2024
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
07/05/2024
Última transação
07/05/2024
Escritório responsável
United States Patent and Trademark Office
Código da situação
700
Cadastro oficial
Principal Register
Código do desenho
5
Tipo de titular
03
Localização do titular
JP
Examinador
HUSSAIN, TASNEEM
Unidade examinadora
M90
Localização atual
FILE REPOSITORY (FRANCONIA)
Descrição da marca
The mark consists of the stylized wording "LASERTEC".
Titulares e representantes
Titulares
L. C. (pessoa física)
Representantes
George W. Lewis WHDA, LLP
Classificação técnica
Classes Nice
Classe 7Classe 9
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 7
Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays
Classe 9
Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus
Publicações
Histórico de despachos e eventos da marca no USPTO.
38 publicações encontradas
FICS
FINAL DISPOSITION NOTICE SENT TO IB
03/11/2024
FIMP
FINAL DISPOSITION PROCESSED
02/11/2024
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
07/08/2024
NRCC
NOTICE OF REGISTRATION CONFIRMATION EMAILED
07/05/2024
R.PR
REGISTERED-PRINCIPAL REGISTER
07/05/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
04/03/2024
GPNX
NOTIFICATION PROCESSED BY IB
26/02/2024
PUBO
PUBLISHED FOR OPPOSITION
20/02/2024
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
07/02/2024
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
07/02/2024
NREP
NEW REPRESENTATIVE AT IB RECEIVED
03/02/2024
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
31/01/2024
NONP
NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
31/01/2024
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
17/01/2024
XAEC
EXAMINER'S AMENDMENT ENTERED
02/01/2024
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
02/01/2024
GNEA
EXAMINERS AMENDMENT E-MAILED
02/01/2024
CNEA
EXAMINERS AMENDMENT -WRITTEN
02/01/2024
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
08/12/2023
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
07/12/2023
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
07/12/2023
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
20/07/2023
ECDR
TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
20/07/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
20/07/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
20/07/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
20/07/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
20/07/2023
RFNT
REFUSAL PROCESSED BY IB
11/07/2023
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
20/06/2023
RFRR
REFUSAL PROCESSED BY MPU
20/06/2023
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
11/05/2023
CNRT
NON-FINAL ACTION WRITTEN
10/05/2023
DOCK
ASSIGNED TO EXAMINER
09/05/2023
MAFR
APPLICATION FILING RECEIPT MAILED
24/01/2023
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
20/01/2023
LIMI
LIMITATION FROM ORIGINAL APPLICATION ENTERED
20/01/2023
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
19/01/2023
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