INNP
PARTIAL INVALIDATION PROCESSED BY THE IB
10/01/2025
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Dado oficial do USPTO
AZ
Sabia que essa marca já está registrada no Estados Unidos?
Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.
Active USPTO registrationTipo: MistaEscritório: US
Snapshot rápido
ST13
US500000079107638Classe
1, 2, 3, 9, 11, 17, 37
Pedido
79107638
Registro
4266234
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
57
Atualização mais recente
10/01/2025
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
1, 2, 3, 9, 11, 17, 37
Data de depósito
27/08/2011
Data de registro
01/01/2013
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
19/03/2024
Última transação
10/01/2025
Escritório responsável
United States Patent and Trademark Office
Código da situação
707
Cadastro oficial
Principal Register
Código do desenho
3
Tipo de titular
31
Localização do titular
Darmstadt, DD
Examinador
CROSS, TRACY
Unidade examinadora
L90
Descrição da marca
The mark consists of the stylized lettering "AZ" inside a darkened triangle.
Titulares e representantes
Titulares
Merck KGaA
AZ Electronic Materials GmbH
AZ Electronic Materials (Luxembourg) S.à.r.l.
AZ Electronic Materials (Luxembourg); S.à.r.l.
Representantes
William C. Wright Epstein Drangel LLP
Classificação técnica
Classes Nice
Classe 1Classe 2Classe 3Classe 9Classe 11Classe 17Classe 37
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 1
Chemical coatingsacid or alkali-resistant nonconducting coatings used to protect desired portions of a circuit pattern from the action of the etchant in the manufacture of semiconductor devices; ceramic precursor chemicals; organic chemicalsinorganic chemicals and photoresists for use in the manufacture of products and components for the electronic and semiconductor industry; chemical preparations for pre-treating base material prior to the application of photo resists; developers for photo resistschemical additives for photo resiststouch-up chemical solutions for use in combination with photo resists; chemicals in liquid form used as an anti-reflective coatings for photo resists for use in the electronics industry; chemical solvents and etchants for the removal of photo resists and organic coatingsfor use in the electronics industry; deletion fluids for removing photo resists; liquid crystal chemical compounds for use in the manufacture of liquid crystal display devices and instruments; mineral chemical products based on silicatesilica sols and silica suspensions; unprocessed artificial resins; unprocessed plastics
Classe 2
Anti-corrosive coatingsrust preventatives in the nature of a coating; thinners for photo resists; protective preparations for metalsanti-tarnishing preparations for coating metals; varnisheslacquerscoloured masticsnatural resins for use as adhesives or sealants; wood preservative; unprocessed natural resins
Classe 3
Cleaning and polishing preparations; polishing waxpolishing creams
Classe 9
Optical films for enhancing light output and uniformityas components of optical equipmentof electronic equipmentof vending machines and of cash dispensers; electro-optic apparatus and instrumentsliquid crystal displays; photographic equipment and apparatuscameras and photolithographic equipment used in the production of integrated circuits; photolithographic equipment for preparing printing plates and matrices by photographic means for use in the printing industry; equipmentapparatus and devices for the application and processing of photo resists; beam splitters
Classe 11
Components of illumination equipment and illumination deviceslight reflectorswindows and lenseswhere each component includes an optical film
Classe 17
Insulating materialselectrical insulating materialsinsulating and protective interlayer dielectric materials and coatings for use in integrated circuitssemiconductor devicescomputer disk drives and other computer hardwareinsulating film for use in the manufacture of semiconductors
Classe 37
Repair of automobiles; car washing
Publicações
Histórico de despachos e eventos da marca no USPTO.
57 publicações encontradas
INPS
PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
10/12/2024
INPC
INVALIDATION PROCESSED
10/12/2024
INPR
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
20/11/2024
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
19/03/2024
71.P
REGISTERED - PARTIAL SEC 71 ACCEPTED
19/03/2024
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
11/03/2024
ES71
TEAS SECTION 71 RECEIVED
03/07/2023
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
01/01/2022
RNWL
INTERNATIONAL REGISTRATION RENEWED
23/09/2021
INNP
PARTIAL INVALIDATION PROCESSED BY THE IB
03/07/2020
CHLD
CHANGE OF OWNER RECEIVED FROM IB
14/05/2020
XXSS
GENERIC MADRID TRANSACTION SENT TO IB
07/05/2020
XXCR
GENERIC MADRID TRANSACTION CREATED
07/05/2020
CHLD
CHANGE OF OWNER RECEIVED FROM IB
16/04/2020
INPR
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
12/02/2020
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
12/06/2019
71.P
REGISTERED - PARTIAL SEC 71 ACCEPTED
12/06/2019
EROP
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
30/05/2019
PR71
POST REGISTRATION ACTION MAILED - SEC.71
06/02/2019
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
24/01/2019
ES71
TEAS SECTION 71 RECEIVED
13/12/2018
REM3
COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
01/01/2018
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
18/04/2016
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
18/04/2016
NREP
NEW REPRESENTATIVE AT IB RECEIVED
12/02/2016
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
06/05/2013
ADCH
CHANGE OF NAME/ADDRESS REC'D FROM IB
26/04/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
12/04/2013
FIMP
FINAL DISPOSITION PROCESSED
12/04/2013
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
01/04/2013
R.PR
REGISTERED-PRINCIPAL REGISTER
01/01/2013
GPNX
NOTIFICATION PROCESSED BY IB
16/10/2012
PUBO
PUBLISHED FOR OPPOSITION
16/10/2012
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
26/09/2012
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
26/09/2012
NPUB
NOTICE OF PUBLICATION
26/09/2012
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
10/09/2012
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
03/09/2012
CNEA
EXAMINERS AMENDMENT MAILED
13/08/2012
XAEC
EXAMINER'S AMENDMENT ENTERED
13/08/2012
ALIE
ASSIGNED TO LIE
10/08/2012
CNEA
EXAMINERS AMENDMENT -WRITTEN
10/08/2012
CNFR
FINAL REFUSAL MAILED
13/07/2012
CNFR
FINAL REFUSAL WRITTEN
12/07/2012
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
14/06/2012
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
13/06/2012
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
13/06/2012
RFNT
REFUSAL PROCESSED BY IB
17/02/2012
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
27/01/2012
RFRR
REFUSAL PROCESSED BY MPU
27/01/2012
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
26/01/2012
CNRT
NON-FINAL ACTION WRITTEN
25/01/2012
MAFR
APPLICATION FILING RECEIPT MAILED
17/01/2012
DOCK
ASSIGNED TO EXAMINER
13/01/2012
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
13/01/2012
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
12/01/2012
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