INNP
PARTIAL INVALIDATION PROCESSED BY THE IB
21/12/2024
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Dado oficial do USPTO
KOELIQ
Sabia que essa marca já está registrada no Estados Unidos?
Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.
Active USPTO registrationTipo: VerbalEscritório: Estados Unidos
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
51
Atualização mais recente
21/12/2024
Tipo de marca
Verbal
Classes Nice
1
Data de depósito
03/10/2011
Data de registro
18/06/2013
Data de expiração
-
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
15/02/2024
Última transação
15/02/2024
Escritório responsável
United States Patent and Trademark Office
Código da situação
706
Cadastro oficial
Principal Register
Código do desenho
4
Tipo de titular
03
Localização do titular
Sodegaura-shiChiba, JP
Examinador
MACIOL II, EUGENE VALENTINE-JO
Unidade examinadora
L30
Localização atual
GENERIC WEB UPDATE
Titulares e representantes
Titulares
KOEI CHEMICAL COMPANY, LIMITED
KOEI CHEMICAL COMPANY, LIMITED
Representantes
Kumiko Ide Wenderoth, Lind & Ponack, L.L.P.
Classificação técnica
Classes Nice
Classe 1
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 1
Chemicals for use in the manufacture of antistatic preparations for clean-room useoil dispersantsbattery electrolyteschemical absorbents for absorbing gaschemical additives for use in the manufacture of rubbers or synthetic resinsantibacterial preparations for use in the manufacture of cosmeticsbeveragesfood products and food supplementscatalysts for use in the manufacture of industrial chemicalsbiochemical catalystsantifouling preparationschemical preparations for use in the manufacture of paintschemical polymeric additives for lubricantsheat mediumsheat transfer fluids for industrial usechemical preparations for use in the manufacture of antiseptics; industrial chemicals; nitrogen compounds; heterocyclic compounds; organic phosphorus compounds; lithium salts; sodium salts; potassium salts; calcium salts; aluminum salts; titanium salts; nickel salts; cupric salts; copper salts; iron salts; magnesium salts; salts of alkaline metals for industrial purposes; salts of alkaline earth metals for industrial purposes; quaternary ammonium salts; quaternary phosphonium salts; ionic liquidslithium saltssodium saltspotassium saltscalcium saltsaluminum saltstitanium saltsnickel saltscupric saltscopper saltsiron saltsmagnesium saltsquaternary ammonium saltsquaternary phosphonium salts with melting points of 100°C or lowerin liquid states at ordinary temperature ; ionic liquidsorganic lithium saltsorganic sodium saltsorganic potassium saltsorganic calcium saltsorganic magnesium salts with melting points of 100°C or lowerin liquid states at ordinary temperature; surface-active chemical preparations for use in industry; antistatic preparations for electronic equipment; oil dispersants; curing agent dispersants for the preparation of plastics; chemical preparations to prevent mildew; battery electrolytes; capacitor electrolytes; salts for galvanic cells; industrial chemicals for absorbing gases; chemical additives for use in the manufacture of rubbers or synthetic resins; organic chemical solvents for use in the manufacture of chemicalssynthetic rubberssynthetic resins; chemical preparations in the nature of organic solubilizer for use in the manufacture of rubbers or synthetic resins; industrial chemicals for the separation of substances from mixturesother than for medical purposes; antibacterial preparationschemicals for industrial purposes; catalysts for use in the manufacture of industrial chemicals; antifouling preparationslithium saltssodium saltspotassium saltscalcium saltsaluminum saltstitanium saltsnickel saltscupric saltscopper saltsiron saltsmagnesium saltsammonium saltsphosphonium saltspyridinium saltsimidazolium salts; metal plating chemical compositions; solvents for stripping photoresists; ionic liquidslithium basedsodium basedpotassium basedcalcium basedmagnesium basedquaternary ammonium basedquaternary phosphonium based salts with melting points of 100°C or lowerin liquid states at ordinary temperature for use in the manufacture of cosmeticsagricultural chemicalsmedicines; ionic liquidslithium basedsodium basedpotassium basedcalcium basedmagnesium basedquaternary ammonium basedquaternary phosphonium based salts with melting points of 100°C or lowerin liquid states at ordinary temperature used as solvents for chemical reactionsseparation of substances from mixturesdissolution of rubbers or synthetic resinsstripping photoresists; ionic liquidslithium-based saltssodium-based saltspotassium-based saltscalcium-based saltsaluminum-based saltstitanium-based saltsnickel-based saltscupric-based saltscopper-based saltsiron-based saltsmagnesium-based salts with melting points of 100°C or lowerin liquid states at ordinary temperature used as antistatic preparationsdispersantselectrolytesabsorbents for gaseschemical additives for rubbers or synthetic resinsantibacterial preparations for industrial purposescatalystsantifouling preparationschemicals for plating processinglubricantsheat mediumsantiseptics; organic lithium saltsorganic sodium saltsorganic potassium saltsorganic calcium saltsorganic aluminum saltsorganic titanium saltsorganic nickel saltsorganic cupric saltsorganic copper saltsorganic iron saltsorganic magnesium saltsorganic ammonium saltsorganic phosphonium saltsorganic pyridinium saltsorganic imidazolium salts having the melting points of 100°C or lower for use in the manufacture of cosmeticsagricultural chemicalsmedicines; organic lithium saltsorganic sodium saltsorganic potassium saltsorganic calcium saltsorganic aluminum saltsorganic titanium saltsorganic nickel saltsorganic cupric saltsorganic copper saltsorganic iron saltsorganic magnesium saltsorganic ammonium saltsorganic phosphonium saltsorganic pyridinium saltsorganic imidazolium salts having the melting points of 100°C or lower as solvents for chemical reactionsseparation of substances from mixturesdissolution of rubbers or synthetic resinsstripping photoresists; organic lithium saltsorganic sodium saltsorganic potassium saltsorganic calcium saltsorganic aluminum saltsorganic titanium saltsorganic nickel saltsorganic cupric saltsorganic copper saltsorganic iron saltsorganic magnesium saltsorganic ammonium saltsorganic phosphonium saltsorganic pyridinium saltsorganic imidazolium salts having the melting points of 100°C or lower used as antistatic preparationsdispersantselectrolytesabsorbents for gaseschemical additives for rubbers or synthetic resinsantibacterial preparations for industrial purposescatalystantifouling preparationschemicals for plating processinglubricantsheat mediumsantiseptics
Publicações
Histórico de despachos e eventos da marca no USPTO.
51 publicações encontradas
INPS
PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
07/11/2024
INPC
INVALIDATION PROCESSED
07/11/2024
INPR
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
17/10/2024
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
15/02/2024
71AG
REGISTERED-SEC.71 ACCEPTED
15/02/2024
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
12/02/2024
ES71
TEAS SECTION 71 RECEIVED
06/06/2023
RNWL
INTERNATIONAL REGISTRATION RENEWED
25/10/2021
NREP
NEW REPRESENTATIVE AT IB RECEIVED
17/04/2021
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - MAILED
05/05/2019
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
05/05/2019
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
01/05/2019
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
18/04/2019
ES75
TEAS SECTION 71 & 15 RECEIVED
18/04/2019
REM3
COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
18/06/2018
ADCH
CHANGE OF NAME/ADDRESS REC'D FROM IB
02/03/2017
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
04/09/2015
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
04/09/2015
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
12/10/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
21/09/2013
FIMP
FINAL DISPOSITION PROCESSED
21/09/2013
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
18/09/2013
R.PR
REGISTERED-PRINCIPAL REGISTER
18/06/2013
GPNX
NOTIFICATION PROCESSED BY IB
19/05/2013
PUBO
PUBLISHED FOR OPPOSITION
02/04/2013
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
13/03/2013
OP2R
NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
13/03/2013
NPUB
NOTICE OF PUBLICATION
13/03/2013
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
22/02/2013
ALIE
ASSIGNED TO LIE
21/02/2013
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
07/02/2013
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
10/01/2013
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
10/01/2013
ERFR
TEAS REQUEST FOR RECONSIDERATION RECEIVED
10/01/2013
CNFR
FINAL REFUSAL MAILED
04/09/2012
CNFR
FINAL REFUSAL WRITTEN
31/08/2012
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
01/08/2012
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
31/07/2012
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
31/07/2012
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
31/07/2012
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
31/07/2012
RFNP
REFUSAL PROCESSED BY IB
17/02/2012
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
02/02/2012
RFRR
REFUSAL PROCESSED BY MPU
02/02/2012
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
01/02/2012
CNRT
NON-FINAL ACTION WRITTEN
31/01/2012
DOCK
ASSIGNED TO EXAMINER
23/01/2012
MAFR
APPLICATION FILING RECEIPT MAILED
13/12/2011
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
09/12/2011
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
08/12/2011
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