TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
05/12/2023
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Dado oficial do USPTO
EDWARDS
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Active USPTO registrationTipo: MistaEscritório: US
Snapshot rápido
ST13
US500000079057964Classe
4, 6, 7, 9, 11, 37, 40, 41, 42
Pedido
79057964
Registro
3767531
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
53
Atualização mais recente
05/12/2023
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
4, 6, 7, 9, 11, 37, 40, 41, 42
Data de depósito
17/10/2007
Data de registro
30/03/2010
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
02/06/2020
Última transação
05/12/2023
Escritório responsável
United States Patent and Trademark Office
Código da situação
706
Cadastro oficial
Principal Register
Código do desenho
3
Tipo de titular
11
Localização do titular
Burgess Hill, GB
Examinador
LOTT, MAUREEN DALL
Unidade examinadora
M80
Localização atual
GENERIC WEB UPDATE
Descrição da marca
The mark consists of the stylized word "EDWARDS" where the top left portion of a stylized "E" is separated from the rest of the letter "E", which is partially enclosed by a semi-ellipse.
Titulares e representantes
Titulares
Edwards Limited
Edwards Limited
Representantes
William S. Fultz Womble Bond Dickinson (US) LLP
Classificação técnica
Classes Nice
Classe 4Classe 6Classe 7Classe 9Classe 11Classe 37Classe 40Classe 41Classe 42
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 4
Industrial oilsmineral oilssilicone oilssynthetic oils and perfluoropolyether oils; Industrial lubricants; Industrial greases; Industrial greasesgreases used as vacuum sealants
Classe 6
METAL VACUUM FLANGE AND METAL VACUUM FLANGE FITTINGS; METAL CLAMPS; COMMERCIAL CONTAINERS OF METAL FOR TRANSPORTING SEMICONDUCTOR PROCESSING EQUIPMENT
Classe 7
Vacuum pumpsoil sealed vacuum pumpsrotary vane pumpsoil sealed rotary pumpsoil sealed piston pumpsvacuum booster pumpsvacuum scroll pumpsdry vacuum pumpsliquid ring vacuum pumpsindustrial dry vacuum pumpsvacuum diaphragm pumpsjet pumpsturbo molecular pumpscompound molecular pumpsregenerative pumpssub-atmospheric vapour pumpsdiffusion pumpschemical pumping systems comprised of valvesvesselspipingfittingspositive displacement pumpsgauges and controllersvacuum pumps for vacuum shelf dryerssteam ejector pumpsall of the aforementioned goods for pumping gases; exhaust gas management apparatus and equipmentexhaust piping; valves being parts of machinesair admittance valvesleak detection valvesdiaphragm valvesball valvesisolation valvesbaffle and isolation valvesbacking/roughing valvesgate valvesbutterfly valvesvent valvescheck valvesgas ballast valvespneumatic shutter control valvessolenoid valvesall of the aforementioned valves for use in connection with pumping gases in vacuum systemssemiconductor and solar pane processes; vacuum deposition machines for deposition of films for use in semiconductor and solar panel processes
Classe 9
Spectrograph apparatus; mass spectrometers; instruments and apparatus for use in testingcontroldetectionmonitoring and the analysis of materials in scientific and industrial operationsinfrared spectrometersultraviolet spectrometersparticle size analyzers and electrochemical sensors; pressure gauges; pressure regulators for use in scientific and industrial vacuum apparatus; leak detectors for fluid leaks in scientific and industrial vacuum systems or apparatus; ionization gauges for use in scientific and industrial vacuum apparatus and systems; magnetron gauges for use in scientific and industrial vacuum apparatus and systems; vacuum gauges for use in scientific and industrial vacuum apparatus and systems; convection gauges for use in scientific and industrial vacuum apparatus and systems; pirani gauges for use in scientific and industrial vacuum apparatus and systems; penning gauges for use in scientific and industrial vacuum apparatus and systems; ion gauges for use in scientific and industrial vacuum apparatus and systems; magnetron gauges for use in scientific and industrial vacuum apparatus and systems; inverted magnetron gauges for use in scientific and industrial vacuum apparatus and systems; wide range gauges for use in scientific and industrial vacuum apparatus and systems; thermocouple gauges for use in scientific and industrial vacuum apparatus and systems; strain gauges for use in scientific and industrial vacuum apparatus and systems; electroacoustic transducers; electrical controllers for gauges; capsule dial gauges for use in scientific and industrial vacuum apparatus and systems; gas sensors for measuring the concentration or presence of target gases in a gas stream; moisture sensors; calibration apparatusinstruments and equipment for the calibration of scientific and industrial vacuum apparatusvacuum instrumentation and vacuum equipment; electronic valves for controlling gas; computer software for monitoring system status and providing data relating to vacuumexhaust abatementchemical use and gas userelating to the manufacture of semiconductors and integrated circuits; computer software for designing and configuring gaschemicalvacuum and exhaust management systems machines; valveselectropneumatic control valves and electric and electronic valves for controlling gas in vacuum systemssemiconductor and solar panel processes
Classe 11
Gas reactorsthermal processorspyrophoritic conditioners and gas separators all for the treatmentpurification and disposal of solidliquid and gaseous matter; water purification units; water treatment equipmentmachines and equipment for treating water that has been used as part of the manufacture of semiconductors in order to remove any poisonous/noxious substances from the water; gas scrubbers; high frequencymicrowave and DC torch plasma gas scrubbers; gas reactorsthermal processorspyrophoritic conditioners and gas separators all for use in exhaust gas abatement; gas burners for burning exhaust gases; gas igniters for igniting exhaust gases; gas heaters for heating exhaust gases; gas scrubbers for cleaning exhaust gases from the semiconductor industry and related fields; integrated gas pumping and scrubbing apparatus/machines for pumping and scrubbing exhaust gases; gas separatorspressure swing absorption separators for the separation of specific gases from an exhaust stream; gas recovery machinesmachines for the recovery of gaseous precursors and noble gases from the semiconductor industry and related fields; wet scrubbers for scrubbing water soluble gases from an exhaust stream and removing particulates from an exhaust stream; water cooled trapsheated traps and filter traps for the collection and/or removal of semiconductor process exhaust products; gas reactors for use in the semiconductor field or related fields; apparatus for controlling the temperature of exhaust gas pipesliquid-cooled chillers for the promotion and/or prevention of condensation of semiconductor process by-products
Classe 37
Repair and maintenance of semiconductor processing equipmentexhaust gas management systemschemical distribution systemswater treatment systemsheat exchangersvacuum apparatus and vacuum pumps and parts and fittings therefor; refurbishment of semiconductor processing equipment; consulting and advisory services in the fields of installation and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Classe 40
Custom manufacturing consultancy and advisory services for othersall regarding manufacturing-related modifications to apparatuses that provide gasesgas mixtureschemicalsvacuum and exhaust management during the manufacture of semiconductors and semiconductor devices
Classe 41
Arranging of educational seminars in the field of vacuum and exhaust management engineering; Training services in the field of designinstallationmodificationcalibrationoperationapplication and maintenance of apparatus for the provision of gases and gas mixtureschemicalsvacuum and/or exhaust management in the manufacture of semiconductors and similar devices
Classe 42
Engineering consultancy and advisory servicesall in the field of calibration of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in the manufacture of semiconductors and similar devices; design consultancy and advisory servicesall in the field of apparatuses for the provision of gases and gas mixtureschemicalsvacuum and exhaust management used in manufacturing semiconductors and similar devices
Publicações
Histórico de despachos e eventos da marca no USPTO.
53 publicações encontradas
EWOR
TEAS WITHDRAWAL AS DOMESTIC REPRESENTATIVE RECEIVED
05/12/2023
ARAA
ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
05/12/2023
REAP
TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
05/12/2023
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
05/12/2023
COAR
TEAS CHANGE OF OWNER ADDRESS RECEIVED
05/12/2023
NREP
NEW REPRESENTATIVE AT IB RECEIVED
04/03/2023
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
02/06/2020
71AG
REGISTERED-SEC.71 ACCEPTED
02/06/2020
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
02/06/2020
ES71
TEAS SECTION 71 RECEIVED
04/03/2020
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
30/03/2019
RNWL
INTERNATIONAL REGISTRATION RENEWED
02/11/2017
ADCH
CHANGE OF NAME/ADDRESS REC'D FROM IB
31/08/2017
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
09/05/2016
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
09/05/2016
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
09/05/2016
ES75
TEAS SECTION 71 & 15 RECEIVED
29/03/2016
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
05/02/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
15/07/2010
FIMP
FINAL DISPOSITION PROCESSED
15/07/2010
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
30/06/2010
R.PR
REGISTERED-PRINCIPAL REGISTER
30/03/2010
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
12/03/2010
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
25/02/2010
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
25/02/2010
PUBO
PUBLISHED FOR OPPOSITION
12/01/2010
NPUB
NOTICE OF PUBLICATION
23/12/2009
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
04/12/2009
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
30/11/2009
CNEA
EXAMINERS AMENDMENT MAILED
23/11/2009
XAEC
EXAMINER'S AMENDMENT ENTERED
23/11/2009
CNEA
EXAMINERS AMENDMENT -WRITTEN
23/11/2009
CNFR
FINAL REFUSAL MAILED
13/11/2009
CNFR
FINAL REFUSAL WRITTEN
13/11/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
23/10/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
23/10/2009
PAPER RECEIVED
15/10/2009
CNRT
NON-FINAL ACTION MAILED
23/04/2009
CNRT
NON-FINAL ACTION WRITTEN
23/04/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
01/04/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
01/04/2009
ALIE
ASSIGNED TO LIE
01/04/2009
PAPER RECEIVED
31/03/2009
NREP
NEW REPRESENTATIVE AT IB RECEIVED
14/11/2008
RFNT
REFUSAL PROCESSED BY IB
31/10/2008
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
06/10/2008
RFRR
REFUSAL PROCESSED BY MPU
06/10/2008
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
04/10/2008
CNRT
NON-FINAL ACTION WRITTEN
03/10/2008
DOCK
ASSIGNED TO EXAMINER
26/09/2008
NWAP
NEW APPLICATION ENTERED
26/09/2008
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
25/09/2008
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