NREP
NEW REPRESENTATIVE AT IB RECEIVED
11/02/2023
Voltar para busca
Dado oficial do USPTO
CEX
Sabia que essa marca já está registrada no Estados Unidos?
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Active USPTO registrationTipo: MistaEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
50
Atualização mais recente
11/02/2023
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
9, 41, 42
Data de depósito
27/05/2008
Data de registro
26/10/2010
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
07/05/2021
Última transação
07/05/2021
Escritório responsável
United States Patent and Trademark Office
Código da situação
709
Cadastro oficial
Principal Register
Código do desenho
3
Tipo de titular
99
Localização do titular
12489 Berlin, DE
Examinador
FINNEGAN, TIMOTHY
Unidade examinadora
L40
Localização atual
GENERIC WEB UPDATE
Descrição da marca
The mark consists of stylized letters "E" and "X", which are comprised of a block format for a non-capitalized letter "e" with the left-portion of the letter "x" adjacent the block letter "c" forming an internal arrow shaped space between the two letters.
Titulares e representantes
Titulares
Plasmetrex GmbH
Plasmetrex GmbH
Representantes
ROBERT CURCIO DeLIO, PETERSON & CURCIO, LLC
Classificação técnica
Classes Nice
Classe 9Classe 41Classe 42
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 9
Electric and electronic measuringcontrollingchecking and regulating apparatusincluded in this classsensors for process development and transfer for etch and low pressure depositionsensors for manufacturing control for etch and low pressure depositionsensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recordingtransmission or reproduction of soundimages and data; apparatus for the determination of process parameters in plasma processessensors for process development and transfer for etch and low pressure depositionsensors for manufacturing control for etch and low pressure depositionsensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition
Classe 41
Education servicesproviding seminarstrainingcourses in the field of semiconductor processing and manufacturingradio frequency technology for plasma applications; providing of seminarstraining and courses in the field of semiconductor processing and manufacturingradio frequency technology for plasma applicationswafer damaginge-chuckarcingplasma nitridation of ultra SiO2 filmsconditioning and loading effects in plasma etching; publication of textsother than publicity textsincluding internet publication of texts
Classe 42
Scientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturingradio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturingradio frequency technology for plasma applications
Publicações
Histórico de despachos e eventos da marca no USPTO.
50 publicações encontradas
NREP
NEW REPRESENTATIVE AT IB RECEIVED
10/02/2023
INNT
TOTAL INVALIDATION PROCESSED BY THE IB
11/07/2022
INTS
TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
06/05/2022
INPC
INVALIDATION PROCESSED
06/05/2022
INTR
TOTAL INVALIDATION OF REG EXT PROTECTION CREATED
07/01/2022
C71T
CANCELLED SECTION 71
07/05/2021
NREP
NEW REPRESENTATIVE AT IB RECEIVED
26/02/2021
NREP
NEW REPRESENTATIVE AT IB RECEIVED
21/06/2019
RNWL
INTERNATIONAL REGISTRATION RENEWED
13/12/2018
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - MAILED
27/09/2016
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
27/09/2016
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
27/09/2016
ES75
TEAS SECTION 71 & 15 RECEIVED
25/08/2016
NREP
NEW REPRESENTATIVE AT IB RECEIVED
11/09/2015
NREP
NEW REPRESENTATIVE AT IB RECEIVED
03/01/2015
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
22/03/2013
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
17/02/2013
FICS
FINAL DISPOSITION NOTICE SENT TO IB
02/02/2011
FIMP
FINAL DISPOSITION PROCESSED
02/02/2011
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
26/01/2011
R.PR
REGISTERED-PRINCIPAL REGISTER
26/10/2010
PUBO
PUBLISHED FOR OPPOSITION
10/08/2010
NPUB
NOTICE OF PUBLICATION
21/07/2010
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
08/07/2010
ALIE
ASSIGNED TO LIE
06/07/2010
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
30/06/2010
ACEC
AMENDMENT FROM APPLICANT ENTERED
09/06/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
09/06/2010
ALIE
ASSIGNED TO LIE
09/06/2010
PAPER RECEIVED
27/05/2010
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
14/01/2010
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
24/12/2009
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
24/12/2009
CNRT
NON-FINAL ACTION MAILED
24/11/2009
CNRT
NON-FINAL ACTION WRITTEN
23/11/2009
DOCK
ASSIGNED TO EXAMINER
03/11/2009
CHAN
APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
18/03/2009
ACEC
AMENDMENT FROM APPLICANT ENTERED
18/03/2009
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
18/03/2009
ALIE
ASSIGNED TO LIE
18/03/2009
PAPER RECEIVED
16/03/2009
RFNT
REFUSAL PROCESSED BY IB
07/11/2008
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
17/09/2008
RFRR
REFUSAL PROCESSED BY MPU
17/09/2008
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
17/09/2008
CNRT
NON-FINAL ACTION WRITTEN
16/09/2008
DOCK
ASSIGNED TO EXAMINER
09/09/2008
NWAP
NEW APPLICATION ENTERED
25/07/2008
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
24/07/2008
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