RNWL
INTERNATIONAL REGISTRATION RENEWED
12/03/2026
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Dado oficial do USPTO
EPICREW
Sabia que essa marca já está registrada no Estados Unidos?
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Active USPTO registrationTipo: MistaEscritório: US
Snapshot rápido
ST13
US500000079027610Classe
7, 9, 37, 40, 41, 42
Pedido
79027610
Registro
3405642
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
61
Atualização mais recente
13/03/2026
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
7, 9, 37, 40, 41, 42
Data de depósito
17/04/2006
Data de registro
01/04/2008
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
20/11/2018
Última transação
13/03/2026
Escritório responsável
United States Patent and Trademark Office
Código da situação
707
Cadastro oficial
Principal Register
Código do desenho
3
Tipo de titular
03
Localização do titular
Omura-City, Nagasaki, JP
Examinador
BROWNE, DAYNA
Unidade examinadora
L40
Titulares e representantes
Titulares
E. C. (pessoa física)
E. C. (pessoa física)
Representantes
George H. Kobayashi MASUDA, FUNAI, EIFERT & MITCHELL, LTD.
Classificação técnica
Classes Nice
Classe 7Classe 9Classe 37Classe 40Classe 41Classe 42
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 7
Industrial robots; Semiconductor manufacturing machines and their parts sold as a unit
Classe 9
Cinematographic cameras; Cameras for photography; Optical condensers; Optical correcting lenses for cameras; Photography diaphragms; Microscopy diffraction apparatus; Photography filterslens filters; Camera lens hoods; Optical lenses for cameras; Scientific and technical apparatusoptical mirrors; Prisms; Stands for photographic apparatuscamera stands
Classe 37
Semiconductor manufacturing machines and systems installationincluding cases of dispatch; Repair or maintenance of optical machines and instrumentsincluding cases of dispatch; Repair or maintenance of semiconductor manufacturing machines and systemsincluding cases of dispatch; Repair or maintenance of integrated circuitsmanufacturing machines and systemsincluding cases of dispatch
Classe 40
Recycling of waste and trash; rental of metalworking machines and tools; rental of semiconductor manufacturing machines and systems
Classe 41
Education and instruction servicestraining on the use of semiconductor manufacturing machines including their parts and systems including cases of dispatch; Education and instruction servicestraining on the use of cinematographic or photographic optical machines and instruments including cases of dispatch; Rental of optical machines and instrumentsrental of cinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for cameras
Classe 42
Design of machinesapparatusinstrumentsincluding their partssystems composed of such machinesapparatus and instruments including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands; Technological advice relating to performance and operation of computersautomobiles and other machines that require high levels of personal knowledgeskill or experience of operators to meet the required accuracy in operating them including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands; Testing and research on machinesapparatus and instruments including cases of dispatchsemiconductor manufacturing machines including their partscinematographic camerascameras for photographyoptical condensersoptical correcting lenses for camerasphotography diaphragmsmicroscopy diffraction apparatusphotography filterslens filterscamera lens hoodsoptical lenses for camerasscientific and technical apparatusoptical mirrorsprisms and stands for photographic apparatuscamera stands
Publicações
Histórico de despachos e eventos da marca no USPTO.
61 publicações encontradas
NREP
NEW REPRESENTATIVE AT IB RECEIVED
20/01/2023
INNP
PARTIAL INVALIDATION PROCESSED BY THE IB
25/10/2019
INPS
PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
14/08/2019
INPC
INVALIDATION PROCESSED
14/08/2019
NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/08/2019
INPR
PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
20/07/2019
NA71
NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
20/11/2018
71.P
REGISTERED - PARTIAL SEC 71 ACCEPTED
20/11/2018
EROP
TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
20/11/2018
PR71
POST REGISTRATION ACTION MAILED - SEC.71
10/10/2018
NREP
NEW REPRESENTATIVE AT IB RECEIVED
05/10/2018
71AF
REGISTERED-SEC.71 FILED
28/09/2018
ES71
TEAS SECTION 71 RECEIVED
28/09/2018
RNWL
INTERNATIONAL REGISTRATION RENEWED
07/06/2018
REM4
COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
01/04/2017
NREP
NEW REPRESENTATIVE AT IB RECEIVED
02/10/2015
NREP
NEW REPRESENTATIVE AT IB RECEIVED
09/04/2015
NA75
NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
19/03/2014
C75A
REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
19/03/2014
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
19/03/2014
715F
REGISTERED - SEC. 71 & SEC. 15 FILED
26/02/2014
ES75
TEAS SECTION 71 & 15 RECEIVED
26/02/2014
FINO
FINAL DECISION TRANSACTION PROCESSED BY IB
22/12/2012
FICS
FINAL DISPOSITION NOTICE SENT TO IB
16/07/2008
FIMP
FINAL DISPOSITION PROCESSED
16/07/2008
FICR
FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
03/07/2008
R.PR
REGISTERED-PRINCIPAL REGISTER
01/04/2008
OPNX
NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
21/03/2008
OPNS
NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
06/03/2008
OPNR
NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
06/03/2008
PUBO
PUBLISHED FOR OPPOSITION
15/01/2008
NPUB
NOTICE OF PUBLICATION
26/12/2007
CNEA
EXAMINERS AMENDMENT MAILED
11/12/2007
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
10/12/2007
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
10/12/2007
XAEC
EXAMINER'S AMENDMENT ENTERED
10/12/2007
CNEA
EXAMINERS AMENDMENT -WRITTEN
10/12/2007
ZZZX
PREVIOUS ALLOWANCE COUNT WITHDRAWN
10/12/2007
PBCR
WITHDRAWN FROM PUB - OG REVIEW QUERY
29/10/2007
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
17/10/2007
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
16/10/2007
ACEC
AMENDMENT FROM APPLICANT ENTERED
15/10/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
15/10/2007
PAPER RECEIVED
12/10/2007
CNRT
NON-FINAL ACTION MAILED
30/05/2007
CNRT
NON-FINAL ACTION WRITTEN
29/05/2007
NREP
NEW REPRESENTATIVE AT IB RECEIVED
24/05/2007
ACEC
AMENDMENT FROM APPLICANT ENTERED
02/05/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
02/05/2007
ALIE
ASSIGNED TO LIE
02/05/2007
PAPER RECEIVED
03/04/2007
TCCA
TEAS CHANGE OF CORRESPONDENCE RECEIVED
27/03/2007
RFNT
REFUSAL PROCESSED BY IB
02/11/2006
RFCS
NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
17/10/2006
RFRR
REFUSAL PROCESSED BY MPU
17/10/2006
RFCR
NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
16/10/2006
CNRT
NON-FINAL ACTION WRITTEN
15/10/2006
DOCK
ASSIGNED TO EXAMINER
06/10/2006
NWAP
NEW APPLICATION ENTERED
06/10/2006
REPR
SN ASSIGNED FOR SECT 66A APPL FROM IB
05/10/2006
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