NA89
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
20/07/2017
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Dado oficial do USPTO
MATHESON TRI·GAS
Sabia que essa marca já está registrada no Estados Unidos?
Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.
Active USPTO registrationTipo: MistaEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
36
Atualização mais recente
07/04/2023
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
1, 4, 5, 9, 11
Data de depósito
12/08/2005
Data de registro
06/11/2007
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
20/07/2017
Última transação
07/04/2023
Escritório responsável
United States Patent and Trademark Office
Código da situação
800
Cadastro oficial
Principal Register
Fundamento do pedido
Intent to use
Primeiro uso
30/09/2004
Primeiro uso no comércio
31/10/2004
Código do desenho
3
Tipo de titular
03
Localização do titular
Parsippany, NJ
Examinador
DINALLO, KEVIN
Unidade examinadora
L70
Localização atual
GENERIC WEB UPDATE
Titulares e representantes
Titulares
M. T. (pessoa física)
Representantes
DEEPAK NAMBIAR KELLEY DRYE & WARREN
Classificação técnica
Classes Nice
Classe 1Classe 4Classe 5Classe 9Classe 11
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 1
Gases for general industrial use1112-tetrafluoroethane; 111-trichioro-222-trifluoroethane; 111-trichloroethane; 1122-tetrachloroethane; 112-trichloro-122-trifluoroethane; 112-trichloroethane; 11-dichloroethylene; 11-difluoroethane; 12-dichiorotetrafluoroethane; 13 butadiene; 1-butene; 1-chloro-2-propanol; 1-chloropropane; 1-hexene; 1-octene; 1-pentene; 224-trimethylpentane; 23-dimethylbutane; 24-dimethylpentane; 25-dimethyithiophene; 2-ethylbutene-1; 2-hexene; 2-methyl butraldehyde; 2-methyl-1-butene; 2-methyl-2-butene; 2-methylbutane; 2-methyihexane; 2-methylpentane; 2-methyithiophene; 2-pentene; 2-propanol; 33-dimethyl-1-butene; 3-methyl-1-butene; 3-methylpentane; 4-methyl-1-pentene; 4-vinylcyclohexene; carbon monoxide; carbon dioxide and nitrogen; ethanol in air; acetaldehyde; acetone; acetonitrile; acetylacetone; acetylene; acrolein; acrylonitrile; acrylonitrile; compressed air; allene; ammonia; antimony pentafluoride; argon; argon and carbon dioxide mixture; argon and helium mixture; argon and oxygen mixture; arsenic fluoride; arsenic pentafluoride; arsine; benzene; benzoic acid; benzyl-D7 chionde; bis2-methoxyethyl adipate; boron trichloride; boron trifluoride; bromine pentafluoride; bromine trifluoride; bromochiorodifluoromethane; bromotrifluoroethylene; butadiene; butyl benzene; butyl mercaptan; butyl nitrate; calibration gas; carbon dioxide; carbon dioxide in argon and helium mixture; carbon disulfide; carbon monoxide; carbon monoxide in air; carbon monoxide in nitrogen; carbontetrachloride; carbonyl fluoride; carbonyl sulfide; alpha-hydro-omega-hydroxy-poly(oxy-12-ethanediyl); chlorine; chlorine trifluoride; multi component mixture containing volatile organics in trace quantities with balance gas nitrogen; chlorobenzene; chlorodifluoromethane; chloroform; chloroiodomethane; chloropentafluoroethane; chlorotrifluoromethane; cinnamaldehyde; cis-12-dichloroethylene; cis-2-butene; cis-2-pentene; cumene; cyanogen; cyanogen chloride; cyclohexane; cyclohexanone; cyclopentane; cyclopropane; deuterium; diborane; dibromomethane; dibutyl ether; dichlorodifluoromethane; dichloromethane; dichloromonofluoromethane; dichiorosilane; dichlorotetrafluoroethane; diethyl disufide; diethyl telluride; difluorodibromomethane; difluoromonochloroethane; digermane; dimethyl ether; dimethyl sulfate; dimethyl sulfide; dimethyl sulfoxide; dimethylamine; dimethyl zinc; dipropyl ether; disilane; dodecane; 2-chloro-1-difluoromethoxy-112-trifluoroethane; ethane; ethanol; ethyl acetate; ethyl acetylene; ethyl acrylate; ethyl alcohol; ethyl benzene; ethyl chloride; ethyl cyclohexane; ethyl ether; ethyl formate; ethyl mercaptan; ethyl methyl sulfide; ethyl sulfide; ethylamine; ethylene; ethylene dichloride; ethylene glycol; ethylene glycol dimethyl ether; ethylene glycol monomethyl ether; ethylene oxide and nitrogen; ethyleneoxide; fluorine; trifluoromethane; fluorotrichloromethane; 2-chloro-2-difluoromethoxy-111-trifluoroethane; formaldehyde gas; furan; furfuryl alcohol; germanium tetrachloride; germanium tetrahydride; trichlorofluoromethane; chlorotrifluoroethylene; trichlorotrifluoroethane; 12-dichloro-1122-tetrafluoroethane; hexafluoroethane; dichlorodifluoromethane; chlorotrifluoromethane; 1112-tetrafluoroethane; bromotrifluoromethane; carbon tetrafluoride; monochlorodifluoromethane; trifluoromethane; octafluorocyclobutane; 111-trifluoro-2-chloro-2-bromoethane; helium; heptane; hexafluoroethane; hexafluoropropene; hexafluorpropylene; hydriodic acid; hydrogen; hydrogen bromide; hydrogen chloride; hydrogen cyanide; hydrogen fluoride; hydrogen selenide; hydrogen sulfide; hydrogen iodide; iodine pentafluoride; isobutane; isobutene; isobutyl alcohol; isobutyl nitrate; isobutylene; isohexene; isopentane; isoprene; isopropyl alcohol; isopropyl chloride; isopropyl ether; isopropyl mercaptan; krypton; methane; methane in argonhelium and nitrogen or air mixture; methane; methane and hydrogen gas mixture; methanol; methoxyflurane; methyl acetate; methyl acetylene; methyl acrylate; methyl alcohol; methyl bromide; methyl chloride; methyl chloroform; methyl disulfide; methyl ethyl ketone; methyl fluoride; methyl formate; methyl iodide; methyl isobutyl ketone; methyl mercaptan; methyl methacrylate; methyl propionate; methyl salicylate; methyl tert-butyl ether; methyl vinyl ketone; dimethoxymethane; methylamine; methylcyclopentane; methylene bromide; methylene fluoride; monomethylamine; m-xylene; n-amylamine; metal oxides and metal chlorides; metal oxidesmetal bromides absorbed hydrogen bromide on compoundhydrogen bromide vapor; metal oxidesmetal chloridesabsorbed hydrogen chloride on compoundhydrogen chloride vapor; organolithium polymerlithium amideanhydrous ammonia; organolithiumsulfur hexafluoridelithium hydride; organolithium polymer and lithium hydride; metal oxides; naphthalene; n-butane; n-butyl acetate; n-butyl alcohol; n-butyl sulfide; n-butyraldehyde; n-decane; neohexane; neon; neopentane; n-heptane; n-hexane; nickel carbonyl; nitric oxide; nitric oxide and nitrogen mixture; nitric oxide and sulfur dioxide and nitrogen gas mixture; nitrogen dioxide; nitrogen trifluoride; nitrosyl chloride; nitrous oxide; n-octane; nonane; n-pentane; n-propyl acetate; n-propyl alcohol; octafluorocyclobutane; octafluorocyclopentene; octane; o-dichlorobenzene; oxides of nitrogen in nitrogen; oxygen in nitrogen; oxygencompressed gas; oxygen and nitrogen gas mixture; o-xylene; pentane; perfluoro-2-butene; perfluoropropane; permanganate and alkali impregnated diatomaceous earth; phosgene; phosphine; phosphine pentafluoride; phosphorus pentafluoride; phosphorus trifluoridepiperidine; tetraethylene glycol dimethyl ether and sodium naphthalene complex; ethylene glycol dimethyl ether and sodium naphthalene complex; propane; propane in air; propane in nitrogen; propionaldehyde; propyl mercaptan; propylene; propylene oxide; p-xylene; pyridine; arsenic fluoride; arsine; boron trifluoride; germanium tetrafluoride; phosphine; silicon tetrafluoride; sec-butyl alcohol; silane; silicon tetrachloride; silicon tetrafluoride; sodium dichromate; sodium dispersion in mineral spirits; sodium dispersion in naphthalene; sodium dispersion in transformer oil; sodium metal dispersion in organic solvent; sodium metal; sodium methylate; sodium shot; styrene; styrene monomer; sulfur dioxide; sulfur dioxide in air; sulfur dioxide in nitrogen; sulfur dioxide and nitrogen mixture; sulfur hexafluoride; sulfur tetrafluoride; sulfuryl fluoride; tert-butyl chloride; tert-butyl mercaptan; tetrachloroethylene; tetraethylene glycol dimethyl ether; tetraethylorthosilicate; tetrafluoroethylene; tetrafluoromethane; tetrahydrofuran; tetrahydronaplithalene; thiophene; titanium tetrachloride; toluene; trans-12-dichloroethylene; trans-2-butene; trans-2-pentene; trans-3-hexene; trans-3-hexene; transition metal salt impregnated diatomaceous earth; trichioroethylene; trichlorsilane; triethyl phosphite; triethylene glycol; trifluorochloroethylene; trifluoromonobromomethane; trimethyl phosphite; trimethylamine; tungsten hexafluoride; undecane; valeraldehyde; vinyl acetate; vinyl bromide; vinyl chloride; vinyl fluoride; vinyl methyl ether; vinylidene chloride; vinylidene fluoride; xenon; zinc arsenide; enriched stable isotopes; stable isotope labeled compounds; and liquefied gasesargoncarbon dioxidenitrogen oxideoxygeno-dichlorobenzene
Classe 4
Gases used as fuels
Classe 5
Gases for medical use
Classe 9
Instrumentsgas chromatographsprocess analyzerslaboratory analyzersgas detectorssafety analyzersspectyophotometersspectrometersdetection systems primarily comprised of gas detectorsgas monitorsgas calibration kits comprised of pressure regulators and flowmeters for field calibration of gas detection systems or portable instrumentationgas analyzersregulators and gaugescontrols and parts thereof for the controlled dispensing and measuring of gases in laboratory and industrial use; flow and level instrumentationflow metersmass flow transducersblendersgas standards generatorsflow-totalizersrotameterscontrol valves for measuring and controlling the flow of gases and for the monitoring and control of gases; apparatus for the handlingmeasuringcontrolled dispensing of compressed gases from cylinderscontrol valvespressure regulators for regulating the handlingmeasuringcontrolled dispensing of compresses gases and cryogenic liquidsflow metersgauges; equipment for gas containment and distributiongas panelsgas cabinetsgas manifoldsswitchover systems primarily comprised of more than one gas sourcetwo regulators and a common discharge linepoint-of-use distribution panelspressure regulatorsflow valvesmonitorspressure transducerspressure monitors; gas detectors and monitors; gas hygrometers; weldersin the nature of electric stick metal arctungsten inert gasmetal inert gasplasmasubmerged arc welderswelding electrodes and wire therefor ; protective maskswelding masksgas masksdust masks; protective gloves; and mass flow meters for flow sensing of gases
Classe 11
Apparatus for the handlingmeasuringcontrolled dispensing of compressed gases in cylindersseparators for filtering and purifying compressed gasesgas scrubbersoxygen generators
Publicações
Histórico de despachos e eventos da marca no USPTO.
36 publicações encontradas
RNL1
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
20/07/2017
89AG
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
20/07/2017
PR89
POST REGISTRATION ACTION MAILED - SEC. 8 & 9
22/06/2017
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
22/06/2017
E89R
TEAS SECTION 8 & 9 RECEIVED
08/05/2017
REM2
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
06/11/2016
NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
22/07/2013
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
22/07/2013
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
22/07/2013
E815
TEAS SECTION 8 & 15 RECEIVED
09/07/2013
R.PR
REGISTERED-PRINCIPAL REGISTER
06/11/2007
REGV
LAW OFFICE REGISTRATION REVIEW COMPLETED
04/10/2007
CNPR
ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
03/10/2007
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
03/10/2007
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
03/10/2007
ALIE
ASSIGNED TO LIE
03/10/2007
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
22/08/2007
CNRT
NON-FINAL ACTION MAILED
20/04/2007
CNRT
SU - NON-FINAL ACTION - WRITTEN
19/04/2007
SUPC
STATEMENT OF USE PROCESSING COMPLETE
19/04/2007
IUAF
USE AMENDMENT FILED
25/01/2007
EISU
TEAS STATEMENT OF USE RECEIVED
25/01/2007
NOAM
NOA MAILED - SOU REQUIRED FROM APPLICANT
01/08/2006
PUBO
PUBLISHED FOR OPPOSITION
09/05/2006
NPUB
NOTICE OF PUBLICATION
19/04/2006
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
25/03/2006
ALIE
ASSIGNED TO LIE
24/03/2006
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
22/03/2006
ACEC
AMENDMENT FROM APPLICANT ENTERED
21/03/2006
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
02/03/2006
PAPER RECEIVED
02/03/2006
CEAP
EXAMINER'S AMENDMENT/PRIORITY ACTION MAILED
15/09/2005
CPEA
EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED
15/09/2005
DOCK
ASSIGNED TO EXAMINER
08/09/2005
NWAP
NEW APPLICATION ENTERED
19/08/2005
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