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Dado oficial do USPTO

MATHESON TRI-GAS ASK...THE GAS PROFESSIONALS

Sabia que essa marca já está registrada no Estados Unidos?

Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.

Active USPTO registrationTipo: MistaEscritório: US

Snapshot rápido

MATHESON TRI-GAS ASK...THE GAS PROFESSIONALS

ST13

US500000078492654

Classe

1, 4, 5, 9

Pedido

78492654

Registro

3353288

Diagnóstico de risco e oportunidade

Leitura executiva para decisão de naming, protocolo e monitoramento.

Atenção: há risco ativo

Situação USPTO

Active USPTO registration

Tipo de processo

Pedido e registro

Eventos registrados

40

Atualização mais recente

07/04/2023

Classificação

Registrada

Tipo de marca

Mista

Classes Nice

1, 4, 5, 9

Data de depósito

30/09/2004

Data de registro

11/12/2007

Data de expiração

-

Ação recomendada

Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.

Próximo passo

Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.

Dados completos do processo

Campos estruturados da autoridade responsável e do histórico oficial.

Data da situação

28/08/2017

Última transação

07/04/2023

Escritório responsável

United States Patent and Trademark Office

Código da situação

800

Cadastro oficial

Principal Register

Fundamento do pedido

Intent to use

Primeiro uso

30/09/2004

Primeiro uso no comércio

31/10/2004

Código do desenho

3

Tipo de titular

03

Localização do titular

Baskin Ridge, NJ

Examinador

DINALLO, KEVIN

Unidade examinadora

L70

Localização atual

GENERIC WEB UPDATE

Titulares e representantes

Titulares

Matheson Tri-Gas, Inc.
Matheson Tri-Gas, Inc.

Representantes

DEEPAK NAMBIEAR KELLEY DRYE & WARREN LLP

Classificação técnica

Classes Nice

Classe 1Classe 4Classe 5Classe 9

Códigos Vienna

Sem códigos Vienna disponíveis.

Produtos e serviços

Classe 1

Gases for general industrial use1112-tetrafluoroethane; 111-trichioro-222-trifluoroethane; 111-trichloroethane; 1122-tetrachloroethane; 112-trichloro-122-trifluoroethane; 112-trichloroethane; 11-dichloroethylene; 11-difluoroethane; 12-dichiorotetrafluoroethane; 13 butadiene; 1-butene; 1-chloro-2-propanol; 1-chloropropane; 1-hexene; 1-octene; 1-pentene; 224-trimethylpentane; 23-dimethylbutane; 24-dimethylpentane; 25-dimethyithiophene; 2-ethylbutene-1; 2-hexene; 2-methyl butraldehyde; 2-methyl-1-butene; 2-methyl-2-butene; 2-methylbutane; 2-methyihexane; 2-methylpentane; 2-methyithiophene; 2-pentene; 2-propanol; 33-dimethyl-1-butene; 3-methyl-1-butene; 3-methylpentane; 4-methyl-1-pentene; 4-vinylcyclohexene; carbon monoxide; carbon dioxide and nitrogen; ethanol in air; acetaldehyde; acetone; acetonitrile; acetylacetone; acetylene; acrolein; acrylonitrile; acrylonitrile; compressed air; allene; ammonia; antimony pentafluoride; argon; argon and carbon dioxide mixture; argon and helium mixture; argon and oxygen mixture; arsenic fluoride; arsenic pentafluoride; arsine; benzene; benzoic acid; benzyl-D7 chionde; bis2-methoxyethyl adipate; boron trichloride; boron trifluoride; bromine pentafluoride; bromine trifluoride; bromochiorodifluoromethane; bromotrifluoroethylene; butadiene; butyl benzene; butyl mercaptan; butyl nitrate; calibration gas; carbon dioxide; carbon dioxide in argon and helium mixture; carbon disulfide; carbon monoxide; carbon monoxide in air; carbon monoxide in nitrogen; carbontetrachloride; carbonyl fluoride; carbonyl sulfide; alpha-hydro-omega-hydroxy-poly(oxy-12-ethanediyl); chlorine; chlorine trifluoride; multi component mixture containing volatile organics in trace quantities with balance gas nitrogen; chlorobenzene; chlorodifluoromethane; chloroform; chloroiodomethane; chloropentafluoroethane; chlorotrifluoromethane; cinnamaldehyde; cis-12-dichloroethylene; cis-2-butene; cis-2-pentene; cumene; cyanogen; cyanogen chloride; cyclohexane; cyclohexanone; cyclopentane; cyclopropane; deuterium; diborane; dibromomethane; dibutyl ether; dichlorodifluoromethane; dichloromethane; dichloromonofluoromethane; dichiorosilane; dichlorotetrafluoroethane; diethyl disufide; diethyl telluride; difluorodibromomethane; difluoromonochloroethane; digermane; dimethyl ether; dimethyl sulfate; dimethyl sulfide; dimethyl sulfoxide; dimethylamine; dimethyl zinc; dipropyl ether; disilane; dodecane; 2-chloro-1-difluoromethoxy-112-trifluoroethane; ethane; ethanol; ethyl acetate; ethyl acetylene; ethyl acrylate; ethyl alcohol; ethyl benzene; ethyl chloride; ethyl cyclohexane; ethyl ether; ethyl formate; ethyl mercaptan; ethyl methyl sulfide; ethyl sulfide; ethylamine; ethylene; ethylene dichloride; ethylene glycol; ethylene glycol dimethyl ether; ethylene glycol monomethyl ether; ethylene oxide and nitrogen; ethyleneoxide; fluorine; trifluoromethane; fluorotrichloromethane; 2-chloro-2-difluoromethoxy-111-trifluoroethane; formaldehyde gas; furan; furfuryl alcohol; germanium tetrachloride; germanium tetrahydride; trichlorofluoromethane; chlorotrifluoroethylene; trichlorotrifluoroethane; 12-dichloro-1122-tetrafluoroethane; hexafluoroethane; dichlorodifluoromethane; chlorotrifluoromethane;1112-tetrafluoroethane; bromotrifluoromethane; carbon tetrafluoride; monochlorodifluoromethane; trifluoromethane; octafluorocyclobutane; 111-trifluoro-2-chloro-2-bromoethane; helium; heptane; hexafluoroethane; hexafluoropropene; hexafluorpropylene; hydriodic acid; hydrogen; hydrogen bromide; hydrogen chloride; hydrogen cyanide; hydrogen fluoride; hydrogen selenide; hydrogen sulfide; hydrogen iodide; iodine pentafluoride; isobutane; isobutene; isobutyl alcohol; isobutyl nitrate; isobutylene; isohexene; isopentane; isoprene; isopropyl alcohol; isopropyl chloride; isopropyl ether; isopropyl mercaptan; krypton; methane; methane in argonhelium and nitrogen or air mixture; methane; methane and hydrogen gas mixture; methanol; methoxyflurane; methyl acetate; methyl acetylene; methyl acrylate; methyl alcohol; methyl bromide; methyl chloride; methyl chloroform; methyl disulfide; methyl ethyl ketone; methyl fluoride; methyl formate; methyl iodide; methyl isobutyl ketone; methyl mercaptan; methyl methacrylate; methyl propionate; methyl salicylate; methyl tert-butyl ether; methyl vinyl ketone; dimethoxymethane; methylamine; methylcyclopentane; methylene bromide; methylene fluoride; monomethylamine; m-xylene; n-amylamine; metal oxides and metal chlorides; metal oxidesmetal bromides absorbed hydrogen bromide on compoundhydrogen bromide vapor; metal oxidesmetal chloridesabsorbed hydrogen chloride on compoundhydrogen chloride vapor; organolithium polymerlithium amideanhydrous ammonia; organolithiumsulfur hexafluoridelithium hydride; organolithium polymer and lithium hydride; metal oxides; naphthalene; n-butane; n-butyl acetate; n-butyl alcohol; n-butyl sulfide; n-butyraldehyde; n-decane; neohexane; neon; neopentane; n-heptane; n-hexane; nickel carbonyl; nitric oxide; nitric oxide and nitrogen mixture; nitric oxide and sulfur dioxide and nitrogen gas mixture; nitrogen dioxide; nitrogen trifluoride; nitrosyl chloride; nitrous oxide; n-octane; nonane; n-pentane; n-propyl acetate; n-propyl alcohol; octafluorocyclobutane; octafluorocyclopentene; octane; o-dichlorobenzene; oxides of nitrogen in nitrogen; oxygen in nitrogen; oxygencompressed gas; oxygen and nitrogen gas mixture; o-xylene; pentane; perfluoro-2-butene; perfluoropropane; permanganate and alkali impregnated diatomaceous earth; phosgene; phosphine; phosphine pentafluoride; phosphorus pentafluoride; phosphorus trifluoridepiperidine; tetraethylene glycol dimethyl ether and sodium naphthalene complex; ethylene glycol dimethyl ether and sodium naphthalene complex; propane; propane in air; propane in nitrogen; propionaldehyde; propyl mercaptan; propylene; propylene oxide; p-xylene; pyridine; arsenic fluoride; arsine; boron trifluoride; germanium tetrafluoride; phosphine; silicon tetrafluoride; sec-butyl alcohol; silane; silicon tetrachloride; silicon tetrafluoride; sodium dichromate; sodium dispersion in mineral spirits; sodium dispersion in naphthalene; sodium dispersion in transformer oil; sodium metal dispersion in organic solvent; sodium metal; sodium methylate; sodium shot; styrene; styrene monomer; sulfur dioxide; sulfur dioxide in air; sulfur dioxide in nitrogen; sulfur dioxide and nitrogen mixture; sulfur hexafluoride; sulfur tetrafluoride; sulfuryl fluoride; tert-butyl chloride; tert-butyl mercaptan; tetrachloroethylene; tetraethylene glycol dimethyl ether; tetraethylorthosilicate; tetrafluoroethylene; tetrafluoromethane; tetrahydrofuran; tetrahydronaplithalene; thiophene; titanium tetrachloride; toluene; trans-12-dichloroethylene; trans-2-butene; trans-2-pentene; trans-3-hexene; trans-3-hexene; transition metal salt impregnated diatomaceous earth; trichioroethylene; trichlorsilane; triethyl phosphite; triethylene glycol; trifluorochloroethylene; trifluoromonobromomethane; trimethyl phosphite; trimethylamine; tungsten hexafluoride; undecane; valeraldehyde; vinyl acetate; vinyl bromide; vinyl chloride; vinyl fluoride; vinyl methyl ether; vinylidene chloride; vinylidene fluoride; xenon; zinc arsenide; enriched stable isotopes; stable isotope labeled compounds; and liquefied gasesargoncarbon dioxidenitrogen oxideoxygeno-dichlorobenzene

Classe 4

Gases used as fuels

Classe 5

Gases for medical use

Classe 9

Instrumentsgas chromatographsprocess analyzerslaboratory analyzersgas detectorssafety analyzersspectyophotometersspectrometersdetection systems primarily comprised of gas detectorsgas monitorsgas calibration kits comprised of pressure regulators and flowmeters for field calibration of gas detection systems or portable instrumentationgas analyzersregulators and gaugescontrols and parts thereof for the controlled dispensing and measuring of gases in laboratory and industrial use; flow and level instrumentationflow metersmass flow transducersblendersgas standards generatorsflow-totalizersrotameterscontrol valves for measuring and controlling the flow of gases and for the monitoring and control of gases; apparatus for the handlingmeasuringcontrolled dispensing of compressed gases from cylinderscontrol valvespressure regulators for regulating the handlingmeasuringcontrolled dispensing of compresses gases and cryogenic liquidsflow metersgauges; equipment for gas containment and distributiongas panelsgas cabinetsgas manifoldsswitchover systems primarily comprised of more than one gas sourcetwo regulators and a common discharge linepoint-of-use distribution panelspressure regulatorsflow valvesmonitorspressure transducerspressure monitors; gas detectors and monitors; gas hygrometers; weldersin the nature of electric stick metal arctungsten inert gasmetal inert gasplasmasubmerged arc welderswelding electrodes and wire therefor; protective maskswelding masksgas masksdust masks; protective gloves; and mass flow meters for flow sensing of gases

Publicações

Histórico de despachos e eventos da marca no USPTO.

40 publicações encontradas

NA89

NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED

28/08/2017

RNL1

REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)

28/08/2017

89AG

REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED

28/08/2017

APRE

CASE ASSIGNED TO POST REGISTRATION PARALEGAL

28/08/2017

E89R

TEAS SECTION 8 & 9 RECEIVED

18/07/2017

REM2

COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED

11/12/2016

NA85

NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED

24/07/2013

C15A

REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.

24/07/2013

APRE

CASE ASSIGNED TO POST REGISTRATION PARALEGAL

15/07/2013

E815

TEAS SECTION 8 & 15 RECEIVED

01/07/2013

R.PR

REGISTERED-PRINCIPAL REGISTER

11/12/2007

REGV

LAW OFFICE REGISTRATION REVIEW COMPLETED

06/11/2007

ALIE

ASSIGNED TO LIE

05/11/2007

CNPR

ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED

03/10/2007

TEME

TEAS/EMAIL CORRESPONDENCE ENTERED

29/09/2007

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

28/09/2007

TROA

TEAS RESPONSE TO OFFICE ACTION RECEIVED

28/09/2007

CNRT

NON-FINAL ACTION MAILED

06/09/2007

CNRT

SU - NON-FINAL ACTION - WRITTEN

05/09/2007

SUPC

STATEMENT OF USE PROCESSING COMPLETE

28/08/2007

EISU

TEAS STATEMENT OF USE RECEIVED

03/08/2007

IUAF

USE AMENDMENT FILED

02/08/2007

EX1G

SOU EXTENSION 1 GRANTED

10/01/2007

EXT1

SOU EXTENSION 1 FILED

10/01/2007

EEXT

SOU TEAS EXTENSION RECEIVED

10/01/2007

NOAM

NOA MAILED - SOU REQUIRED FROM APPLICANT

08/08/2006

PUBO

PUBLISHED FOR OPPOSITION

16/05/2006

NPUB

NOTICE OF PUBLICATION

26/04/2006

PREV

LAW OFFICE PUBLICATION REVIEW COMPLETED

27/03/2006

ALIE

ASSIGNED TO LIE

24/03/2006

CNSA

APPROVED FOR PUB - PRINCIPAL REGISTER

17/03/2006

ACEC

AMENDMENT FROM APPLICANT ENTERED

16/03/2006

CRFA

CORRESPONDENCE RECEIVED IN LAW OFFICE

02/03/2006

MAIL

PAPER RECEIVED

02/03/2006

GEAP

EXAMINER'S AMENDMENT/PRIORITY ACTION E-MAILED

15/09/2005

CPEA

EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED

15/09/2005

GEAP

EXAMINER'S AMENDMENT/PRIORITY ACTION E-MAILED

25/04/2005

CPEA

EXAMINERS AMENDMENT AND/OR PRIORITY ACTION - COMPLETED

25/04/2005

DOCK

ASSIGNED TO EXAMINER

25/04/2005

NWAP

NEW APPLICATION ENTERED

12/10/2004

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