NA89
NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
13/09/2021
Voltar para busca
Dado oficial do USPTO
VEM
Sabia que essa marca já está registrada no Estados Unidos?
Antes de investir em nome, identidade e divulgação, valide risco de colisão e estratégia de registro para não perder tempo nem budget.
Active USPTO registrationTipo: MistaEscritório: US
Diagnóstico de risco e oportunidade
Leitura executiva para decisão de naming, protocolo e monitoramento.
Situação USPTO
Active USPTO registration
Tipo de processo
Pedido e registro
Eventos registrados
44
Atualização mais recente
13/09/2021
Classificação
Registrada
Tipo de marca
Mista
Classes Nice
1, 6
Data de depósito
23/07/2009
Data de registro
17/05/2011
Data de expiração
-
Ação recomendada
Execute uma análise de colidência completa e valide classes antes de qualquer protocolo ou investimento de marca.
Próximo passo
Esses são os detalhes do processo de registro. Mesmo assim, o monitoramento constante é o que garante tranquilidade de que o seu principal ativo continue protegido.
Dados completos do processo
Campos estruturados da autoridade responsável e do histórico oficial.
Data da situação
13/09/2021
Última transação
13/09/2021
Escritório responsável
United States Patent and Trademark Office
Código da situação
800
Cadastro oficial
Principal Register
Primeiro uso
29/02/1988
Primeiro uso no comércio
29/02/1988
Código do desenho
5
Tipo de titular
03
Localização do titular
Santa Clara, CA, US
Examinador
BEN, LINDSEY HEATHER
Unidade examinadora
L80
Localização atual
GENERIC WEB UPDATE
Descrição da marca
The mark consists of the letters "VEM", with a horizontal space separating the top portion of the right side of the "V", the "E" and the "M" from the bottom portion; the top of the "E" extends over the top of the right side of the "V".
Titulares e representantes
Titulares
Vacuum Engineering & Materials Co., Inc.
Vacuum Engineering & Materials Co., Inc.
Representantes
Grace Han Stanton PERKINS COIE LLP
Classificação técnica
Classes Nice
Classe 1Classe 6
Códigos Vienna
Sem códigos Vienna disponíveis.
Produtos e serviços
Classe 1
Oxides and carbides in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of oxides and carbides bonded with oxides and carbides used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics
Classe 6
Titanium aluminumtungsten titaniumaluminum siliconaluminum silicon copperaluminum coppergold tingold germaniumgold nickeliron hafniumiron zirconiumcobalt iron tantalumnickel chromium silicontungsten silicon alloyscermetsrefractory compoundsrefractory blocks of metalrefractory shapes of metalfired refractory materials of metal in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of metal bonded with titanium aluminumtungsten titaniumaluminum siliconaluminum silicon copperaluminum coppergold tingold germaniumgold nickeliron hafniumiron zirconiumcobalt iron tantalumnickel chromium silicontungsten silicon alloyscermetsrefractory compoundsrefractory blocks of metalrefractory shapes of metalfired refractory materials of metal used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; Precious and semi-precious metals in pelletsgranulestabletsflakespowderrodwire and foil format for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics; discs and sputtering targets made primarily of precious and semi-precious metals bonded with precious and semi-precious metals used in physical vapor deposition chambers and other manufacturing processes for thin film coating of substrates and substrate materials for use in the fields of semiconductorcompound semiconductorwireless radio frequency and microwaveprecision optics/laserphotovoltaic/solaremerging display technologiesdata storagemicro-electro-mechanical systemsautomotiveaerospace/defenseophthalmics
Publicações
Histórico de despachos e eventos da marca no USPTO.
44 publicações encontradas
RNL1
REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
13/09/2021
89AG
REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
13/09/2021
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
13/09/2021
E89R
TEAS SECTION 8 & 9 RECEIVED
12/05/2021
REM2
COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
17/05/2020
NA85
NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
13/12/2017
C15A
REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
13/12/2017
APRE
CASE ASSIGNED TO POST REGISTRATION PARALEGAL
13/12/2017
E815
TEAS SECTION 8 & 15 RECEIVED
17/11/2017
R.PR
REGISTERED-PRINCIPAL REGISTER
17/05/2011
NPUB
OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
01/03/2011
PUBO
PUBLISHED FOR OPPOSITION
01/03/2011
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
26/01/2011
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
24/01/2011
XAEC
EXAMINER'S AMENDMENT ENTERED
24/01/2011
GNEN
NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
24/01/2011
GNEA
EXAMINERS AMENDMENT E-MAILED
24/01/2011
CNEA
EXAMINERS AMENDMENT -WRITTEN
24/01/2011
ZZZX
PREVIOUS ALLOWANCE COUNT WITHDRAWN
24/01/2011
PBCR
WITHDRAWN FROM PUB - OG REVIEW QUERY
21/01/2011
PREV
LAW OFFICE PUBLICATION REVIEW COMPLETED
13/01/2011
ALIE
ASSIGNED TO LIE
12/01/2011
CNSA
APPROVED FOR PUB - PRINCIPAL REGISTER
16/12/2010
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
24/11/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
24/11/2010
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
24/11/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
24/05/2010
GNRT
NON-FINAL ACTION E-MAILED
24/05/2010
CNRT
NON-FINAL ACTION WRITTEN
24/05/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
21/05/2010
GNRT
NON-FINAL ACTION E-MAILED
21/05/2010
CNRT
NON-FINAL ACTION WRITTEN
21/05/2010
TEME
TEAS/EMAIL CORRESPONDENCE ENTERED
01/05/2010
CRFA
CORRESPONDENCE RECEIVED IN LAW OFFICE
30/04/2010
TROA
TEAS RESPONSE TO OFFICE ACTION RECEIVED
30/04/2010
DOCK
ASSIGNED TO EXAMINER
06/01/2010
GNRN
NOTIFICATION OF NON-FINAL ACTION E-MAILED
30/10/2009
GNRT
NON-FINAL ACTION E-MAILED
30/10/2009
CNRT
NON-FINAL ACTION WRITTEN
30/10/2009
DOCK
ASSIGNED TO EXAMINER
26/10/2009
MPMK
NOTICE OF PSEUDO MARK MAILED
28/07/2009
NWOS
NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
27/07/2009
NWAP
NEW APPLICATION ENTERED
27/07/2009
Proteção contínua da sua marca
Seja avisado a cada novo depósito que ameace VEM ou a sua marca.
Vigilância profissional por 24 meses: monitoramos o USPTO por você e alertamos a tempo de você se opor — antes que o conflito vire prejuízo.